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采用脉冲偏压电弧离子镀设备在高速钢基体上沉积Ti/TiN纳米多层硬质薄膜,通过仅改变偏压幅值的方法进行对比实验.XRD分析和薄膜断截面SEM形貌显示出薄膜的纳米多层组织结构;硬度测试表明纳米多层薄膜硬度随脉冲偏压升高而升高,在-900V时超过同等条件制备的TiN单层薄膜,硬度高达34.1GPa;分析表明硬度的提高主要与脉冲偏压工艺对薄膜组织的改善有关;用脉冲偏压电弧离子镀可以制备纳米多层硬质薄膜,并且在工艺控制上相对简单.

参考文献

[1] Holleck H;Schier V .Multilayer PVD coatings for wear protection[J].Surface and Coatings Technology,1995,76-77:328-336.
[2] Henja Jensen;Gunnar Sorensen;Ilze Mannike;Faina Muktepavela;Jaroslav Sobota .Reactive sputtering of nanostructured multilayer coatings and their tribological properties[J].Surface & Coatings Technology,1999(0):1070-1075.
[3] Naoto Kikuchi;Masaru Kitagawa;Akishige Sato;Eiji Kusano;Hidehito Nanto;Akira Kinbara .Elastic and plastic energies in sputtered multilayered Ti-TiN films estimated by nanoindentation[J].Surface & Coatings Technology,2000(2/3):131-135.
[4] Holmberg K;Ronkainen H;Mathews A.coating tribology contact mechanisms and surface design[A].LondonWuK,1977:251.
[5] Fessmann J;Olbrich W;G Kampschulte et al.cathodic arc deposition of TiN and Zr ( C, N) at low substrate temperatures using a pulsed bias voltage[J].Materials Science and Engineering A,1991,140:830-837.
[6] Perry A J;Tian A F;Treglio J R et al.Thin TiN and TiB2 coatings with low residual stress deposited at different temperatures by cathodic arc ion plating[J].Surface and Coatings Technology,1994,68-69:528-535.
[7] Perry A J;Treglio J R;Tian A F .Low-temperature deposition of titanium nitride[J].Surface and Coatings Technology,1995,76-77:815-820.
[8] Li Zhengyang;Zhu Wubiao;Zhang Yong;Li Guiying;Cao Eryan .Effects of superimposed pulse bias on TiN coating in cathodic arc deposition[J].Surface & Coatings Technology,2000(1/3):158-161.
[9] G.Q.Lin,Z.F.Ding,D.Qi,N.H.Wang,M.D.Huang,D.Z.Wang,Y.N.Wang,C.DONG,L.S.Wen.FUNDAMENTAL PROBLEMS IN PULSED-BIAS ARC DEPOSITION[J].金属学报(英文版),2002(01):91-103.
[10] Guoqiang Lin;Yanhui Zhao;Huimei Guo;Dezhen Wang;Chuang Dong;Rongfang Huang;Lishi Wen .Experiments and theoretical explanation of droplet elimination phenomenon in pulsed-bias arc deposition[J].Journal of Vacuum Science & Technology, A. Vacuum, Surfaces, and Films,2004(4):1218-1222.
[11] 黄美东,孙超,林国强,董闯,闻立时.脉冲偏压电弧离子低温沉积TiN硬质薄膜的力学性能[J].金属学报,2003(05):516-520.
[12] Klug P;Alexander L E.X-Ray Diffraction Procedures for Polycrystalline and Amorphous Materials[M].Wiley-Interscience New York,1974
[13] Mattox D M .Particle bombardment effects on thin-film deposition: A review[J].Journal of Vacuum Science and Technology,1989,7(03):1105-1114.
[14] Wen L S;Huang R F;Guo L P et al.Microstmcture and mechanical properties of metal/ceramic Ti/TiN multilayers[J].Journal of Magnetism and Magnetic Materials,1993,126:200-202.
[15] Duck A.;Gesatzke W.;Griepentrog M.;Osterle W.;Sahre M. Urban I.;Gamer N. .Ti/TiN multilayer coatings: deposition technique, characterization and mechanical properties[J].Surface & Coatings Technology,2001(0):579-584.
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