采用均匀的多孔阳极氧化铝做掩膜在氢化物气相外延设备中生长出高质量的氮化镓膜.采用扫描电镜观察了氮化镓膜的界面性质并用阴极发光谱表征了截面上氮化镓层在不同位置的的发光性质,发现随着厚度的增加,其发光特性得到改善,而且由于掩膜结构的引入,外延膜中的压应力得到一定程度的释放.
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