不同剂量的银离子被注入到采用反应磁控溅射(RMS)制备出的TiO2薄膜中.实验发现,薄膜的成分以二氧化钛和单质银为主,薄膜中可以看到银的纳米晶颗粒.注入的银离子在薄膜中呈近高斯分布,分布峰随注入剂量的增加而向表层移动.银离子注入后原本致密平整的TiO2薄膜表面出现了沟壑和晶粒粗化现象,且均方根粗糙度随注入剂量的增加而增加.不同的注入剂量对薄膜的表面能没有明显的影响.
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