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利用AFM研究了在不同衬底温度及蒸发条件下制备的有机半导体材料PTCDA在P-Si(100)形成的薄膜讨论了其表面形貌及岛状晶核分布与生长温度之间的机理.

参考文献

[1] 张福甲,王德明,张德江,甘润今,刘凤敏.Si基有机异质结势垒特性的研究[J].半导体光电,2000(03):182-185.
[2] 张福甲,王德明.PTCDA/p-Si异质结势垒的形成及电流传输机理分析[J].甘肃科学学报,2000(01):1-5.
[3] ZHANG Fu-jia;SHAO Jia-feng;ZHANG De-jiang et al.Preparation of organic semiconductor PTCDA and studies on its struture indication and specific prorerty of light absorption[J].Journal of Luminescence,1999,20(04):351-357.
[4] Krause B;Durr A C;Ritley K et al.Stucture and growth of an archetypal for organic epitaxy:PTCDA on Ag (111)[J].Physical Review B,2002,66:235404-235414.
[5] Umbach E;Sokolowski M;Fink R .Substrate -interaction,long-range order,and epitaxy of large organic.adsorbates[J].Applied Physics A:Materials Science and Processing,1996,63:565-576.
[6] Soubiron T;Vaurette F;Grandidier B.Adsorption of PTDCA on Si (100) and Si (100)-H[J].Nanotechnology,2004(03):383-386.
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