在常温下,用脉冲磁控溅射方法石英玻璃和硅片上制备了薄膜,经过450℃退火,得到V2O5薄膜.用XRD、XPS和AFM对薄膜微观结构进行了测试,用分光光度计测量从200～2500nm波段V2O5薄膜的透射和反射光谱.结果表明,V2O5薄膜纯度高、相结构单一、结晶度好.室温到320℃范围内电阻变化2个量级,薄膜的光学能隙为2.46eV,与V2O5体材料性能一致.
参考文献
| [1] | Wruck D;Ramamurthi S;Rubin M .Sputtered electrochromic V2O5 films[J].THIN SOLID FILMS,1989(182):79-85. |
| [2] | Carolyn Rubin Aita;Ying-Li Liu;Mci Lee Kao et al.Optical behavior of sputter-deposited vanadium pentoxide[J].Journal of Applied Physics,1986,60(02):749-753. |
| [3] | Yoshitaka Fujita;Katsuhiro Miyazaki;Chiei Tatsuyama.On the electrochromism of evaported V2O5 films[J].Japanese Journal of Applied Physics,1985(24):1082-1086. |
| [4] | Ramana CV.;Naidu BS.;Reddy PJ.;Hussain OM. .SPECTROSCOPIC CHARACTERIZATION OF ELECTRON-BEAM EVAPORATED V2O5 THIN FILMS[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,1997(1/2):219-226. |
| [5] | Ozer N. .ELECTROCHEMICAL PROPERTIES OF SOL-GEL DEPOSITED VANADIUM PENTOXIDE FILMS[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,1997(1/2):80-87. |
| [6] | Deki S.;Kajinami A.;Aoi Y. .A NOVEL WET PROCESS FOR THE PREPARATION OF VANADIUM DIOXIDE THIN FILM[J].Journal of Materials Science,1997(16):4269-4273. |
| [7] | Zhang JG.;Turner J.;Ginley D.;Mcgraw JM. .CHARGING CAPACITY AND CYCLING STABILITY OF VOX FILMS PREPARED BY PULSED LASER DEPOSITION[J].Journal of the Electrochemical Society,1997(5):1630-1634. |
| [8] | 吴刚.材料结构表征及应用[M].北京:化学工业出版社,2002:277-278. |
| [9] | 何宇亮;陈光华;张仿清.非晶半导体物理学[M].北京:高等教育出版社,1989 |
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