以铟、锡氯化物为前驱物,采用溶胶-凝胶法在玻璃基体上制备不同锡掺杂的ITO膜,在热处理温度为450 ℃条件下制备不同锡掺杂(质量分数11 %～33 %)的ITO膜,研究锡掺杂对ITO膜方阻和结构特性的影响.用四探针法测量ITO膜的方阻并对样品进行X射线衍射分析,结果表明:锡掺杂量在20 %时ITO膜的方阻最小,不同锡掺杂的ITO膜均为立方铁锰矿结构,锡掺杂会影响ITO膜晶粒尺寸、晶格常数和晶面取向等结构特性,ITO膜的晶粒较大、晶格畸变小、择优取向小时薄膜方阻较小.
参考文献
| [1] | 徐自强,邓宏,谢娟,等.掺Al对ZnO薄膜结构和光电性能的影响[J].液晶与显示,2005,20(6):503-507. |
| [2] | 肖华,王华,任鸣放.基于磁控溅射技术的ZAO透明导电薄膜及靶材的研究[J].液晶与显示,2006,21(1):158-165. |
| [3] | Kim Hwamin,Jung Sangkuan,Ahn Jeungsun,et al.Electrical and optical properties of In2O3-ZnO films deposited on polyethylene terephthalate substrates by radio frequency magnetron sputtering[J].Jpn.J.Appl.Phys.,2003,42(1):223-227. |
| [4] | Biai I,Quintela M,Mendes L,et al.Performances exhibited by large area ITO layers produced by r.f.magnetron sputtering[J].Thin Solid Films,1999,337(1):171-175. |
| [5] | Noda Kazuhiro,Sato Hirotoshi,Itaty Hisao,et al.Characterization of Sn-doped In2O3 film on roll-to-roll flexible plastic substrate prepared by DC magnetron sputtering[J].Jpn.J.Appl.Phys.,2003,42(1):217-222. |
| [6] | 王刚,刘宏宇,赵超,等.低阻高透过率ITO薄膜的制备与性能[J].液晶与显示,1999,14(1):23-27. |
| [7] | 马颖,张方辉,靳宝安,等.ITO透明导电薄膜的制备及光电特性研究[J].液晶与显示,2004,19(5):376-379. |
| [8] | Ma Jin,Zhang Dehang,Li Shuying,et al.Optical and electrical properties of Sn-doped indium oxide films deposited on polyester by reactive evaporation[J].Jpn.J.Appl.Phys.,1998,37(10):5614-5617. |
| [9] | Lau S,Kaiser N,ZollerA,et al.Room-temperature deposition of indium tin oxide thin films with plasma aion-assisted evaporation[J].Thin Solid Films,1998,335(1):1-5. |
| [10] | Frederick Ojo Adurodija,Hirokazu Izumi,Tsuguo Ishihara,et al.Pulsed laser deposition of low-resistivity indium tin oxide thin films at low substrate temperature[J].Jpn.J.Appl.Phys.,1999,38(5):2710-2716. |
| [11] | Aiko Narazaki,Yoshizo Kawaguchi,Hiroyuki Niino,et al.Improvement in electrical conductivity of indium tin oxide films prepared via pulsed laser deposition on electric-field-applied substrates[J].Jpn.J.Appl.Phys.,2002,41(6):3760-3761. |
| [12] | 逄茂林,林君,于敏,等.发光薄膜的制备及应用[J].液晶与显示,2002,17(5):372-280. |
| [13] | Alam M J,Cameron D C.Investigation of annealing effects on sol-gel deposited indium tin oxide thin films in diffe-rent atmospheres[J].Thin Solid Films,2002,420(1):76-82. |
| [14] | Alam M J,Cameron D C.Characterization of transparent conductive ITO thin films deposited on titanium dioxide film by a sol-gel process[J].Surface and Coatings Technology,2001,142(3):776-780. |
| [15] | Qiang Wei,Haixing Zheng,Yuhong Huang.Direct patterning ITO transparent conductive coatings[J].Solar Energy Materials & Solar Cells,2001,68(2):383-390. |
| [16] | 马颖,韩薇,张方辉.X射线衍射分析热处理温度对透明导电膜结构与导电性能的影响[J].液晶与显示,2005,20(4):314-317. |
| [17] | 陈猛,白雪冬,黄荣芳,等.In2O3:Sn和ZnO:Al透明导电薄膜的结构及其导电机制[J].半导体学报,2000,21(4):394-399. |
| [18] | 范志新,孙以材,陈玖琳.氧化物半导体透明导电薄膜的最佳掺杂含量理论计算[J].半导体学报,2001,22(11):1382-1386. |
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