设计了基于VO2的非对称FP腔薄膜结构的智能热控涂层,并应用光学模拟计算的方法研究了不同膜层厚度对薄膜结构辐射率的影响,以及辐射率随角度的变化规律.计算结果表明,当相变层VO2层的厚度从15 nm增至120 nm时,薄膜结构的辐射率变化△ε先增加再减小,VO2厚度为50 nm时,△ε达到最大,约为0.6.介质层HfO2的厚度主要影响多层薄膜结构的高温吸收带位置,但△ε在HfO2层厚度为800～1 000 nm,均可达到约0.6的最大值.多层薄膜结构在0°～ 70°,仍保持明显的辐射率变化,△ε在0.4以上.
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