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研究了高纯铝片在硫酸-磷酸-乙二醇体系中的电化学抛光工艺.确定了电化学抛光体系的配方.探讨了阳极电流密度、抛光温度、抛光时间和搅拌方式对抛光质量的影响.获得了最佳抛光工艺参数:Ja=25 A/dm2,θ=85~93 ℃,t=10~15 min,机械搅拌.新的环保型电化学抛光体系为制备优良的AAO模板奠定了基础.

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