采用直流磁控溅射法在不同衬底温度下(27、150、300、450和750℃)制备 Ta2 O5薄膜。利用X射线衍射、扫描电子显微镜(SEM)和紫外-可见光分光光度计对薄膜的结构、表面形貌和光学性质进行分析研究。实验结果表明,当衬底温度为450℃时,薄膜开始结晶。低于450℃,薄膜为无定形态,光学透过率随着衬底温度的升高而升高,在可见光区域最大透过率为85％。薄膜结晶生成晶粒,会对通过的光束产生散射,降低透过率,光学性能下降。这些结果说明衬底温度和薄膜材料的结构、结晶转变温度及光学性质密切相关。
Ta2 O5 thin films were prepared by reactive magnetron sputtering technique.The microstructure,mor-phology and optical properties of the films deposited at different substrate temperature were investigated by X-ray diffraction,scanning electron microscopy (SEM)and spectrophotometer.The Ta2 O5 thin film begin to crys-tallized when substrate temperature reach to 450 ℃.The films were amorphous when temperature was less than 450℃,and the transmittance of thin films would increase with the enhancing substrate temperature.The high-est transmittance during visible light region was 85%.In other hand,when the films were crystallization,they would produce a lot of crystalline particles,which would cause scattering,reduce the transmittance.The results showed that substrate temperature had a close relationship with the structure and crystalline properties and op-tical properties of the Ta2 O5 thin films.
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