采用脉冲式静电辅助的气溶胶化学气相沉积方法成功的在Si(100)衬底上制备了Y_2O_3薄膜,研究了退火对Y_2O_3沉积薄膜的形貌、结构和光学性质的影响.X射线衍射分析结果表明沉积得到的Y_2O_3薄膜在退火前为非晶态结构,退火之后薄膜具有立方结构,并且具有(111)择优取向.SEM分析显示薄膜在退火后更加平滑、致密.椭偏仪的测试结果表明薄膜退火后的折射系数提高,消光系数减少.
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