基于半导体和金属间的相变特性,伴随着温度、电场、压力的变化,具有相关智能特性的VO_2薄膜材料具有较大的应用潜力.本文主要阐述脉冲激光沉积技术在制备金属氧化物方面的物理过程和技术特点,详细介绍脉冲激光沉积制备VO_2薄膜材料的工艺参数和国内外研究进展,并与几种常规制备方法进行对比,给出脉冲激光沉积掺杂对VO_2薄膜材料特性的影响,以及采用脉冲激光沉积制备VO_2纳米材料,讨论了脉冲激光沉积制备具有智能特性的VO_2薄膜材料存在的问题和发展方向.
Based on the characteristics of semiconductor and metal phase transition, with temperature variations, electric or magnetic fields, and pressure variations, vanadium dioxide thin film with smart properties has great potential. Physical processes and technical characteristics of the pulsed laser deposition in the context of the preparation of metal oxide were mainly described, and process parameters and study at home and abroad in the fabrication of vanadium dioxide thin film material were presented, and the contrast among several traditional fabrication methods was provided.The effect of doping by pulsed laser deposition to the properties of vanadium dioxide thin film, and VO_2 nano-material fabricated by pulsed laser deposition were given.The problems and future of fabrication of vanadium dioxide thin film material with smart properties by pusled laser depostion were discussed.
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