利用等离子体化学气相沉积(PECVD)法制备出Ge1-xCx薄膜,并系统地研究了工艺参数对薄膜成分的影响,以及不同组分Ge1-xCx薄膜的红外光学特性.结果表明,薄膜中的C含量随着CH4/GeH4气体流量比的增大而增大;薄膜的红外折射率随组分的不同在2～4范围内变化;薄膜的沉积速率随射频功率增大而增大,但当功率达到60 W以后其变化不明显;沉积速率随温度的增加而减少;该薄膜具有透长波红外的性能.
参考文献
| [1] | LETTINGTONAH;WORT C J H;MONACHAN B C .DevelopmentsandIRapplicationsofGeCthinfilms[J].Window and Dome Technologies and Materials SPIE,1989,1112:156-161. |
| [2] | SAHRE;WILD CH;KOIDL P.Amorphous hydrogenated carbon germanium films for hand multiplayer IR optical coatings[A].USA:SPIE,1990 |
| [3] | MATINPM;JOHNSTON J W;BENNETT W D .Propertiesofreactively-depositedSiCandGeCalloys[J].Optical Thin Films Ⅲ New Developments SPIE,1990,1323:291-298. |
| [4] | LiuZT;ZHUJZ;XUNK et al.StructureandpropertiesofgermaniumcarbidefilmspreparedbyRFreactivesputteringinAr/CH4[J].Japanese Journal of Applied Physics,1997,36:3625-3628. |
| [5] | 刘正堂.反应溅射GexC1-x薄膜的沉积速率[J].材料工程,1998(02):6. |
| [6] | 宋建全,刘正堂,于忠奇,耿东生,郑修麟.GexC1-x薄膜在红外增透保护膜系设计和制备中的应用[J].红外与毫米波学报,2000(04):266-268. |
| [7] | M. Gazicki;R. Ledzion;R. Mazurczyk;S. Pawlowski .Deposition and properties of germanium/carbon films deposited from tetramethylgermanium in a parallel plate RF discharge[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,1998(1/2):123-131. |
| [8] | M. Gazicki;G. Janowska .Thermal stability of semiconducting thin germanium/carbon alloy films produced from tetraethylgermanium in an RF glow discharge[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,1999(1/2):6-8. |
| [9] | J. Szmidt;M. Gazicki-Lipman;H. Szymanowski;R. Mazurczyk;A. Werbowy;A. Kudla .Electrophysical properties of thin germanium/carbon layers produced on silicon using organometallic radio frequency plasma enhanced chemical vapor deposition process[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,2003(1/2):192-199. |
| [10] | Vilcarromero J.;Andreu J.;Marques FC. .Bonding properties of rf-co-sputtering amorphous Ge-C films studied by X-ray photoelectron and Raman spectroscopies[J].Journal of Non-Crystalline Solids: A Journal Devoted to Oxide, Halide, Chalcogenide and Metallic Glasses, Amorphous Semiconductors, Non-Crystalline Films, Glass-Ceramics and Glassy Composites,1998(Pt.A):427-431. |
| [11] | CATHERINEY;TURBAN G.InfraredabsorptionofhydrogenatedamorphousSi-CandGe-Cfilms[J].THIN SOLID FILMS,1980(70):101-104. |
| [12] | 杨烈宇;关文铎;顾卓明.材料表面薄膜技术[M].北京:人民交通出版社,1991 |
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