电沉积ZnO薄膜超声处理后结构和缺陷的研究

电镀与精饰 , 2011, 33(3): 4-7. doi: 10.3969/j.issn.1001-3849.2011.03.002

电沉积ZnO薄膜超声处理后结构和缺陷的研究

李敏 ^1, , 王树元 ^2, , 彭友舜 ^3, , 秦秀娟 ^4, , 邵光杰 ^5,

1.燕山大学环境与化学工程学院,河北,秦皇岛066004

2.河北科技师范学院理化学院,河北,秦皇岛,066004

3.河北科技师范学院理化学院,河北,秦皇岛,066004

4.燕山大学环境与化学工程学院,河北,秦皇岛066004

5.燕山大学环境与化学工程学院,河北,秦皇岛066004

关键词： ZnO薄膜 , 超声处理 , 缺陷 , 光致发光

Study on Structure and Defect of ZnO Film Prepared by Electrodeposition and Ultrasonic post-treatment

以辛基酚聚氧乙烯(10)醚为有机添加剂,阴极电沉积制备了ZnO薄膜.经超声处理后,用X-射线衍射仪和光致发光光谱仪研究了ZnO薄膜的结构、应力状态和发光性能的变化.结果表明:样品的结晶性能变差,晶格内部的压应力变为张应力,于λ=395 nm处的激子发光峰和λ=580nm处的黄光发光峰强度比减小,同时发光谱中又出现了于λ=428 nm的蓝光峰.分析认为λ位于580 nm处的黄光发射是由VoZni复合缺陷与价带顶的跃迁引起的,而λ位于428 nm的蓝光发射则是由Zni与价带顶之间的跃迁引起.

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电沉积ZnO薄膜超声处理后结构和缺陷的研究

Study on Structure and Defect of ZnO Film Prepared by Electrodeposition and Ultrasonic post-treatment

参考文献