化学镀Co-B合金(Ⅰ)

电镀与精饰 , 2004, 26(6): 1-26. doi: 10.3969/j.issn.1001-3849.2004.06.001

化学镀Co-B合金(Ⅰ)

王莉萍 ^1, , 吴玉程 ^2, , 李云 ^3, , 张勇 ^4, , 李广海 ^5,

1.合肥工业大学,材料科学与工程学院,安徽,合肥,230009

2.合肥工业大学,材料科学与工程学院,安徽,合肥,230009

3.合肥工业大学,材料科学与工程学院,安徽,合肥,230009

4.中国科学院,固体物理研究所,安徽,合肥,230031

5.中国科学院,固体物理研究所,安徽,合肥,230031

基金项目: 安徽省自然科学基金(00046403)

关键词：化学镀 , Co-B合金 , 纳米晶 , 沉积速率

Co-B Alloy Electroless Plating(Ⅰ)

利用化学镀的方法,以硫酸钴为主盐,二甲基胺硼烷为还原剂,制备纳米晶Co-B合金,研究了在各种条件下沉积速率的变化.结果表明合适的工艺参数的选择,可得到较好的沉积速率,并可由此得到一个化学镀Co-B合金纳米晶的较优配方参数.

参考文献

[1]	Erb U .Electrodeposited nanocrystals: Synthesis, properties and industrial application[J].Nanostructured Materials,1995,6(01):533-538.
[2]	Yamasaki T. .High-strength nanocrystalline nickel-tungsten alloys produced by electrodeposition[J].Galvanotechnik: Leiterplatten-Technik,2000(9):2603-2606.
[3]	吴丰;褚松竹 .化学复合镀镍-硼-三氧化二铝的研究[J].表面技术,1994,23(04):154-158.
[4]	Xinmin Huang;Zonggang Deng .A wear-resistant composite coating[J].Plating and Surface Finishing,1993,80(02):62-65.
[5]	翟金坤;黄子勋.化学镀镍[M].北京:航空工业出版社,1987:4-34.
[6]	曲彦平;李德高 .化学镀Ni-P-Al2O3工艺及性能研究[J].表面技术,1999,28(06):3-6.
[7]	Kwangl Pojenl .Structure and properties of electroless Ni-P-Al2O3 deposits[J].Plating and Surface Finishing,1989,76(01):48-50.
[8]	李爱昌;姚素薇;郭鹤桐 .(Ni-W)-SiC复合镀层的研制[J].功能材料,1995,26(03):275-277.
[9]	闫洪.现代化学镀镍和复合镀新技术[M].北京:国防工业出版社,1999:1-30.
[10]	Talaat A;El-Mallah;Hassib M Abbas;Mahmoud M Nassar, et al.Autocatalytic (electroless) Ni-P-B alloy, Part Ⅱ:Some practical aspects[J].Metal Finishing,1993,91(07):47-50.
[11]	Sampath P Kumar;Kesavan P Nair .Structural transformations in electroless Ni-P-B deposits[J].Plating and Surface Finishing,1994,81(05):96-100.
[12]	Kazuyoushi O Kuno .[J].Plating and Surface Finishing,1990,77(02):48-52.
[13]	Chang Y H;Lin C C;Hung M P et al.The microstructure and magnetic properties of electeroless-plated Co-B thin films[J].Journal of the Electrochemical Society,1986,133(05):985-988.
[14]	Ichiro Koiwa;Masanori Toda;Tatsuya Osaka et al.Effect of film thickness on the magnetic properties of electroless cobalt alloy plating films for perpendicular magnetic recording madia[J].Journal of the Electrochemical Society,1986,133(03):597-600.
[15]	Saka T O;Homma T;Saito K et al.Co-based soft magnetic films produced by electroless deposition[J].Journal of the Electrochemical Society,1992,139(05):1311-1313.
[16]	Osamu Takano;Hitoshi .Matsuda electroless cobalt alloy plating for magnetic recording media[J].Metal Finishing,1985,83(01):63-68.
[17]	Ichiro Koiwa;Hiroshi Matsubara;Tetsuya Osaka .The structure of electroless cobalt alloy films for perendicular magnetic recording media[J].Journal of the Electrochemical Society,1986,133(04):685-689.
[18]	沈憧棐,汤俭,刘志辉,陈皓明,张平城,白春礼.化学镀钴基垂直磁化膜的磁力显微镜研究[J].科学通报,1996(02):144-147.
[19]	张立德;牟季美.纳米材料和纳米结构[M].北京:科学出版社,2002:319-321.
[20]	都有为 .纳米材料中的巨磁电阻效应[J].物理学进展,1997,17(02):180-188.

上一张下一张

计量

下载量()
访问量()

作者相关

文章评分

您的评分：
1

0%
2

0%
3

0%
4

0%
5

0%

材料期刊网

化学镀Co-B合金(Ⅰ)

Co-B Alloy Electroless Plating(Ⅰ)

参考文献