欢迎登录材料期刊网

材料期刊网

高级检索

概述了非晶硅薄膜的金属诱导晶化原理,介绍了Al,Ni两种金属诱导非晶硅薄膜晶化的一般规律,详细探讨了金属诱导条件下非晶硅薄膜的本质晶化机理,旨在为非晶硅薄膜的低温成核、晶化机理研究和多晶硅薄膜的研发制备提供实验支持与理论参考.

参考文献

[1] Gogoi P;Dixit PN;Agarwal P .Amorphous silicon films with high deposition rate prepared using argon and hydrogen diluted silane for stable solar cells[J].Solar Energy Materials and Solar Cells: An International Journal Devoted to Photovoltaic, Photothermal, and Photochemical Solar Energy Conversion,2007(13):1253-1257.
[2] Muthmann, S.;Gordijn, A. .Amorphous silicon solar cells deposited with non-constant silane concentration[J].Solar Energy Materials and Solar Cells: An International Journal Devoted to Photovoltaic, Photothermal, and Photochemical Solar Energy Conversion,2011(2):573-578.
[3] Jeffrey Yang;Baojie Yan;Subhendu Guha .Amorphous and nanocrystalline silicon-based multi-junction solar cells[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,2005(1/2):162-169.
[4] 马康,王海燕,吴芳,卢景霄,郜小勇,陈永生.PECVD低温制备微晶硅薄膜的研究[J].人工晶体学报,2008(01):97-101.
[5] Ferlauto AS.;Rovira PI.;Wronski CR.;Collins RW.;Ganguly G.;Koh J. .Modeling the dielectric functions of silicon-based films in the amorphous, nanocrystalline and microcrystalline regimes[J].Journal of Non-Crystalline Solids: A Journal Devoted to Oxide, Halide, Chalcogenide and Metallic Glasses, Amorphous Semiconductors, Non-Crystalline Films, Glass-Ceramics and Glassy Composites,2000(Pt.A):269-273.
[6] Soo Young Yoon;Seong Jin Park;Kyung Ho Kim;Jin Jang .Metal-induced crystallization of amorphous silicon[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,2001(1/2):34-38.
[7] Muramatsu SI.;Minagawa Y.;Oka F.;Sasaki T.;Yazawa Y. .Thin-film c-Si solar cells prepared by metal-induced crystallization[J].Solar Energy Materials and Solar Cells: An International Journal Devoted to Photovoltaic, Photothermal, and Photochemical Solar Energy Conversion,2002(1/4):275-281.
[8] GESTEL D VAN;GORDON I;POORTMANS J.Metal Induced Crystallization of Amorphous Silicon for Photovoltaic Solar Cells[J].Physics Procedia,2011(11):196-199.
[9] 蒋百灵,李洪涛,蔡敏利,苗启林,杨波.退火温度对Al、Cu、Ni诱导Si薄膜晶化进程的影响[J].金属热处理,2010(06):33-36.
[10] 崔海昱,涂洁磊,邓菊莲,王志刚,龙维绪.玻璃衬底多晶硅薄膜太阳电池的制备[J].可再生能源,2008(05):72-75.
[11] Nast O.;Pritchard S.;Aberle AG.;Wenham SR.;Brehme S. .Aluminium-induced crystallisation of silicon on glass for thin-film solar cells[J].Solar Energy Materials and Solar Cells: An International Journal Devoted to Photovoltaic, Photothermal, and Photochemical Solar Energy Conversion,2001(1/4):385-392.
[12] EBIL Ozgenc;APARICIO Roger;BIRKMIRE Robert .Aluminium-induced Crystallisation of Amorphous Silicon Films Deposited by Hot Wire Chemical Vapor Deposition on Glass Substrates[J].THIN SOLID FILMS,2010,519(01):178-183.
[13] TUZUN O;QIU Y;GORDON I et al.Properties of Ntype Polycrystalline Silicon Solar Cells Formed by Alumium Induced Crystallization and CVD Thickening[J].Solar Energy Materials & Solar Cells,2010,94(11):1869-1874.
[14] 王光伟,张建民.电场增强金属Al和Ni诱导非晶硅横向结晶[J].真空科学与技术学报,2008(04):325-330.
[15] A. Behnam;F. Karbassian;S. Mohajerzadeh;A. Ebrahimi;M.D. Robertson .Low-temperature nickel-induced nano-crystallization of silicon on PET by MIC, hydrogenation and mechanical stress[J].Solid-State Electronics,2006(9/10):1618-1624.
[16] Nast O.;Koschier LM.;Sproul AB.;Wenham SR.;Puzzer T. .Aluminum-induced crystallization of amorphous silicon on glass substrates above and below the eutectic temperature[J].Applied physics letters,1998(22):3214-3216.
[17] Oliver Nast;Andreas J. Hartmann .Influence of interface and Al structure on layer exchange during aluminum-induced crystallization of amorphous silicon[J].Journal of Applied Physics,2000(2):716-724.
[18] Ruichun Wang;Piyi Du;Ge Shen;Wenjian Weng;Gaorong Han .Study on Al-induced crystallization of Al/a-Si:H bilayer thin film[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,2002(1/2):225-229.
[19] OE. Tuezuen;A. Slaoui;I. Gordon;A. Focsa;D. Ballutaud;G. Beaucarne;J. Poortmans .N-type polycrystalline silicon films fonned on alumina by aluminium induced crystallization and overdoping[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,2008(20):6892-6895.
[20] Zhengxia Tang;Honglie Shen;Haibin Huang;Linfeng Lu;Yugang Yin;Hong Cai;Jiancang Shen .Preparation of high quality polycrystalline silicon thin films by aluminum-induced crystallization[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,2009(19):5611-5615.
[21] KIM Hyeongnam;KIM Daewon;LEE Gyuyul.Polycrystalline Si Films Formed by Al-induced Crystallization with and without Si Oxides at A1/a-Si Interface[J].Solar Energy Materials & Solar Cells,2002(74):323-329.
[22] 黄金英,赵玉环,张志伟,荆海,凌志华.Ni金属诱导晶化非晶硅(a-Si:H)薄膜[J].液晶与显示,2005(05):397-400.
[23] Mitsutoshi Miyasaka;Kenji Makihira;Tanemasa Asano;Efstathios Polychroniadis;John Stoemenos .In situ observation of nickel metal-induced lateral crystallization of amorphous silicon thin films[J].Applied physics letters,2002(6):944-946.
[24] 张良艳,林祖伦,祁康成,韦新颖.金属Ni诱导非晶硅薄膜晶化研究[J].电子器件,2010(01):10-12.
[25] 刘传珍,杨伯梁,李牧菊,吴渊,张玉,廖燕平,王大海,黄锡珉,邱法斌.Ni金属诱导多晶硅薄膜的低温制备与性能研究[J].吉林大学自然科学学报,2000(03):45-48.
[26] 梁戈,郭烈萍,李洪涛,蒋百灵,焦栋茂.铝层厚度对铝诱导非晶硅薄膜晶化过程的影响[J].人工晶体学报,2011(01):114-118.
[27] 焦栋茂,王新征,李洪涛,郭烈萍,蒋百灵.退火时间对铝诱导非晶硅薄膜晶化过程的影响[J].人工晶体学报,2011(02):370-373,378.
[28] Choi JH.;Kim DY.;Park SJ.;Choo BK.;Jang J. .Temperature dependence of the growth of super-grain polycrystalline silicon by metal induced crystallization[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,2003(1/2):289-293.
[29] ORNAGHI C;BEAUCARNE G;POORTMANS J.Aluminum-induced Crystallization of Amorphous Silicon:Influence of Material Characteristics on the Reaction[J].THIN SOLID FILMS,2004(451/452):476-480.
[30] Schneider J;Klein J;Muske M;Gall S;Fuhs W .Aluminum-induced crystallization of amorphous silicon: preparation effect on growth kinetics[J].Journal of Non-Crystalline Solids: A Journal Devoted to Oxide, Halide, Chalcogenide and Metallic Glasses, Amorphous Semiconductors, Non-Crystalline Films, Glass-Ceramics and Glassy Composites,2004(0):127-130.
[31] Li JF;Sun XW;Yu MB;Qi GJ;Zeng XT .Nickel induced lateral crystallization behavior of amorphous silicon films[J].Applied Surface Science: A Journal Devoted to the Properties of Interfaces in Relation to the Synthesis and Behaviour of Materials,2005(1/4):155-160.
[32] Cheng-Chang Peng;Chen-Kuei Chung;Jen-Fin Lin .Formation of microcrystalline silicon films using rapid crystal aluminum induced crystallization under low-temperature rapid thermal annealing[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,2010(23):6966-6971.
[33] Thanh Nga Nguyen;Van Duy Nguyen;Sungwook Jung;Junsin Yi .The metal-induced crystallization of poly-Si and the mobility enhancement of thin film transistors fabricated on a glass substrate[J].Microelectronic engineering,2010(11):2163-2167.
[34] PRATHAP P;TUZUN O;MADI D et al.Thin Film Silicon Solar Cells by A1C on Foreign Sincerely Yours,Ubstrates[J].Solar Energy Materials & Solar Cells,2011,95(01):S44-S52.
上一张 下一张
上一张 下一张
计量
  • 下载量()
  • 访问量()
文章评分
  • 您的评分:
  • 1
    0%
  • 2
    0%
  • 3
    0%
  • 4
    0%
  • 5
    0%