为提高石英玻璃表面金属化膜层与基底的结合强度,利用金属蒸发真空弧(MEVVA)离子源引出的Ti离子对石英玻璃及镀Ti膜石英玻璃进行离子注入,剂量选择3×10~(16),5×10~(16) ion/cm~2,模拟分析了注入离子能量的分布,采用卢瑟福背散射分析了注入Ti离子在基体中的深度分布,利用划痕实验机对比了镀Ti膜石英玻璃经Ti离子注入前后的膜基结合强度.实验结果表明:石英玻璃经Ti离子(5×10~(16) ion/cm~2)注入后,钛在基体中呈高斯分布,最大浓度分布在15～35 nm范围内;镀Ti膜石英玻璃经Ti离子(5×10~(16) ion/cm~2)注入后,最大浓度分布在5～15 nm范围内,注入离子穿透薄膜进入基材内部.Ti离子注入剂量为5×10~(16) ion/cm~2时,膜基的结合强度比未注入样品提高了90%.
Titanium ions were implanted into quartz and quartz coated with Ti film by MEVVA(Metal Vapor Vacuum Arc)ion source implanter.The dose was 3×10~(16) ions/cm2 and 5×10~(16) ions/cm2.The ion energy and depth distribution were analyzed using simulation method. Depth profiles of Ti concentration were measured by RutIlerf-0rd Backscattering Spectrometry(RBS).The interfacial adhesion and bond strength between thin film coating and substrate were tested by scratch method. The result shows that implanted with Ti the largest component of Ti is about 30 nm for quartz and 15nm for quartz coated with Ti film.Implantation ions penetrated into the substrate through the film. The interfacial adhesion and bond strength between thin film coating and substrate have an increase of 90% after Ti ions implantation with the dose of 5×10~(16) ions/cm~2.
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