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纳米结构单体组分分布的研究对基础研究及应用探索具有非常重要的意义.应用高分辨场发射俄歇电子能谱和扫描电子束对在550℃和640℃生长温度下分别沉积在硅单晶衬底上的纳米锗硅量子点结构的形貌和表面组分分布进行观察,结果表明:表层分布元素不是纯锗、硅或均匀单一的锗硅合金,而是不均匀分布的锗硅混合物.纳米结构内,元素呈不均匀分布,锗元素富集在中心部位.640℃生长温度下的相同形貌的纳米点结构显示不同的元素分布性质.组分分布的巨大差异是由不同温度下硅向锗中不均匀偏析所致.

参考文献

[1] Denker U.;Stoffel M.;Schmidt OG. .Probing the lateral composition profile of self-assembled islands - art. no. 196102[J].Physical review letters,2003(19):6102-0.
[2] Malachias A.;Kycia S.;Medeiros-Ribeiro G.;Magalhaes-Paniago R.;Kamins TI.;Williams RS. .3D composition of epitaxial nanocrystals by anomalous x-ray diffraction: Observation of a Si-rich core in Ge domes on Si(100) - art. no. 176101[J].Physical review letters,2003(17):6101-0.
[3] Capellini G;Seta M D;Evangelisti F .SiGe Intermixing in GeSi islands[J].Applied Physics Letters,2001,78:303-305.
[4] Liao XZ.;Zou J.;Cockayne DJH.;Wan J.;Jiang ZM.;Jin G.;Wang KL. .Alloying, elemental enrichment, and interdiffusion during the growth of Ge(Si)/Si(001) quantum dots - art. no. 153306[J].Physical Review.B.Condensed Matter,2002(15):3306-0.
[5] 王赫莹,李德高.镁及镁合金表面电镀镍工艺的研究[J].表面技术,2004(05):48-49,54.
[6] 张建新,杨迎新.6063铝型材表面斑点腐蚀的成因分析[J].电镀与涂饰,2002(06):38-40,46.
[7] Akitoshi Ishizaka;Yasuhiro Shiraki .Low temperature surface cleaning of silicon and its application to silicon MBE[J].Journal of the Electrochemical Society,1986,133:666-671.
[8] Xue F;Qin J;Cui J;Fan YL;Jiang ZM;Yang XJ .Studying the lateral composition in Ge quantum dots on Si(001) by conductive atomic force microscopy[J].Surface Science: A Journal Devoted to the Physics and Chemistry of Interfaces,2005(1/3):65-71.
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