为研究Si的加入及含量对薄膜结构和性能的影响,采用磁控反应溅射法制备了一系列不同Si含量的Ti-Si-N复合膜,采用XRD、微力学探针和SEM研究了薄膜的微结构、力学性能和抗氧化性.结果表明:随着Si含量的增加,薄膜晶粒尺寸减小,硬度升高,抗氧化性能提高.Si含量为4%～12%(原子数分数)时,晶粒尺寸随含量增加而急剧下降;当Si含量超过9%时,薄膜硬度处于峰值区;Si含量在7%以上时,薄膜具有较高的抗氧化能力.探讨了Ti-Si-N复合膜硬度升高和抗氧化能力提高的机理.
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