为了了解直流等离子喷射CVD自支撑金刚石膜高温氧化机理,利用热失重的方法研究了金刚石膜在不同温度、不同氧浓度条件下的氧化反应.结果表明:CVD金刚石膜氧化反应中的反应指数大约为0.63,氧化反应的激活能为220kJ/mol.通过X-Ray和Raman分析可知,CVD金刚石膜的氧化经历3个过程:1)金刚石膜表面氢的解吸和氧的吸附;2)金刚石与氧发生化学反应;3)金刚石氧化产物(CO、CO2)的解吸.
参考文献
[1] | Sussmann R S;Coe S E .CVD diamond:a new engineering material for thermal,dielectric and optical applications[J].Industrial Diamond Review,1998,3:69-72. |
[2] | 梁英教.物理化学[M].北京:冶金工业出版社,1983:38-60. |
[3] | F.X. Lu;W.Z. Tang;T.B. Huang .Large area high quality diamond film deposition by high power DC arc plasma jet operating at gas recycling mode[J].Diamond and Related Materials,2001(9-10):1551-1558. |
[4] | Alam M;Sun Q .The kinetics of chemical vapor deposited diamond-oxygen reaction[J].Journal of Materials Research,1993,8(11):2870-2878. |
[5] | Evans T;Phaal C .Imperfections in Type I and Type II Diamonds[J].Proceedings of the Royal Society of London.Series A:Mathematics and Physical Sciences,1962,270(1343):538-552. |
[6] | Tankala K;DebRoy T;Alam M et al.Oxidation of diamond films synthesized by hot filament assisted chemical vapor deposition[J].Journal of Materials Research,1990,5:2483-2489. |
[7] | Nimmagadda R R;Joshi A;Hsu W L .Role of microstructure on the oxidation behavior of microwave plasma synthesized diamond and diamond-like carbon films[J].Journal of Materials Research,1990,5:2445-2450. |
[8] | Curtis E Johnson;Michael A;S Hasting;Wayne A Weimer .Thermogravimetric analysis of the oxidation of CVD diamond films[J].Journal of Materials Research,1990,5:2320-2325. |
[9] | Sun Q;Alam M .Relative Oxidation Behavior of Chemical Vapor Deposited and Type IIa Natural Diamonds[J].Journal of the Electrochemical Society,1992,139:933-936. |
[10] | 刘敬明 .大面积化学气相沉积金刚石自支撑膜氧化性能的研究[D].北京科技大学,2002. |
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