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通过磁控反应溅射在H1模具钢表面沉积了CrN薄膜.用扫描电镜(SEM)、X射线衍射仪(XRD)观察了试样的表面形貌,进行了物相分析,研究了CrN薄膜的抗氧化性能,讨论了膜层的抗氧化行为和机制.结果表明:在500℃以下,CrN膜层具有良好的抗氧化性,能大大提高基体的抗氧化性能.当温度超过600℃时,由于膜层产生剥落而失去使用性能.

参考文献

[1] Xu Junhua;Li Geyang;Gu Mingyuan .The microstructure and superhardness effect of the polycrystalline TaN/TiN and TaWN/TiN superlattice flms[J].Acta Metallurgica Sinica (China),1999,35(11):1214-1218.
[2] Xu Junhua;Lihua Yu;Kojima I et al.Thermal stress hardening of a-Si3N4/nc-TiN nanostructured multilayers[J].Applied Physics Letters,2002,81(22):4139-4141.
[3] Junhua Xu.Effect deposition parameters on composition, structure, density and topography of CrN films deposited by r.f magenetron sputtering[J].Applied Surface Science,2002(201):201-218.
[4] Soe W H;Yamamoto R .Mechanical properties of ceramic multilayers:TiN/CrN,TiN/ZrN,and TiN/TaN[J].Materials Chemistry and Physics,1997,50:176-181.
[5] 姜世杭,许俊华,李戈扬.Si3N4/CrN nanostructured multilayers grown by RF reactive magnetron sputtering[J].中国有色金属学会会刊(英文版),2004(04):692-696.
[6] 韩增虎,田家万,戴嘉维,张慧娟,李戈扬.磁控溅射CrNx薄膜的制备与力学性能[J].功能材料,2002(05):500-502.
[7] Fu-Hsing Lu;Hong-Ying Chen .Phase changes of CrN films annealed at high temperature under controlled atmosphere[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,2001(0):368-373.
[8] Han S.;Guo XJ.;Tsai SH.;Su YO.;Huang JH.;Lu FH.;Shih HC.;Lin JH. .The effect of Cr interlayer on the microstructure of CrN coatings on steel[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,2000(0):578-584.
[9] Wang H W;Stack M M .Wear associated with growth defects in combined cathodic arc/unbalanced magnetron sputtered CrN/NbN superlattice coatings during erosion in alkaline slurry[J].Surface and Coatings Technology,2000,135(01):82-90.
[10] Barshilia;Harish C;Prakash M et al.Structure,hardness and thermal stability of TiAlN and nanolayered TiAlN/CrN multilayer films[J].Vacuum,2005,77(02):169-179.
[11] Thorsten Kacsich;Klaus-Peter Lieb .Oxidation of thin CrN and Cr2N films analyzed Via nuclear reaction analysis and Rutherford backscattering[J].Thin Solid Films,1994,235:4.
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