介绍了当今深受关注的等离子聚合薄膜的制备技术.其中,重点探讨了在低能通量和高能通量条件下制备等离子聚合物的沉积过程、膜的结构形态及主要性能,并对近来人们在中等能量通量下制备的等离子聚合体的研究情况做了简要描述.与此同时,还就各种不同等离子聚合薄膜的实际应用及发展前景进行了概括.
参考文献
| [1] | Konig H;Helwig G;Physik Y .[J].,1950,129:49. |
| [2] | Brockes A;Konig H;Physik Y .[J].,1958,152:75. |
| [3] | Bell A;T Curr .Topics Chem[J].Plasma Chem,1980,43:94. |
| [4] | Osada Y;Biederman H .Plasma Chemistry of Polymers[J].Advances in Polymer Science,1990,95:342. |
| [5] | Agostmo R D.Plasma Deposition[M].Treatment and EtchingofPolymners, Academic Press, New York,1990 |
| [6] | Yasuda H.Plasma Polymerization, Academic Press[M].Orlando, FL,1985 |
| [7] | Biederman H;Osada Y.Plasma Polymerization Processes[M].Elsevier. Amsterdam,1992 |
| [8] | Lam D K;Baddour R F;Stancell A F;M. Shen.Plasma Chemistry of Polymers. Marcel Dekker[M].New York,1976 |
| [9] | Poll H U;Arty M;Wickleder K H .[J].European Polymer Journal,1976,12:505. |
| [10] | Tibbitt J M;Shen M;Bell A T et al.[J].Science Chemistry,1976,Al0:1623. |
| [11] | Lopez G P;Ratner B D .[J].Polymer Science Part A Polymer Chemistry,1992,30:2415. |
| [12] | Lopez G P;Ratner B D .[J].Langmuir,1991,7:766. |
| [13] | Kiaei D;Hoffman A S;Hanson S R et al.[J].Materials Research,1992,26:375. |
| [14] | Han LCM.;Timmons RB.;Rajeshwar K. .FILM CHEMISTRY CONTROL AND ELECTROCHEMICAL PROPERTIES OF PULSED PLASMA POLYMERIZED FERROCENE AND VINYLFERROCENE[J].Langmuir: The ACS Journal of Surfaces and Colloids,1997(22):5941-5950. |
| [15] | BadyalJPS.[A].IFE, London,1999 |
| [16] | 吴人洁.高聚物的表面与界面[M].北京:科学出版社,1998:181. |
| [17] | Holland L .[P].British Patent Application 1582231,1976. |
| [18] | Biederman H;Martinu J;Zemek J .[J].Vacuum,1986,35:447. |
| [19] | Kay E;Phys Z;D-Atoms .[J].Molecules and Clusters,1986,3:251. |
| [20] | Leidlich D;Schuhemi A .Diamond Relat[J].Mater,1992,1:1169. |
| [21] | Agostino R;Lamenddola R;Umbach H G et al.[J].Journal of Vacuum Science and Technology,1994,A12:308. |
| [22] | Jones DI;Stewart AD .[J].Philosophical Magazine,1982,B46:423. |
| [23] | Biederman H;Kohoutek K;chemi Z et al.[Z].,1990,40:251. |
| [24] | Ohkawa H;Ozawa K;Ischihara K et al.[A].Tokyo,1993,35 |
| [25] | Biederman H;Slavinska D .[J].Surface and Coatings Technology,2000,125:371-376. |
| [26] | Biederman H;Howson R P;Slavlnska D et al.[J].Vacuum,1997,48:883. |
| [27] | Lehmerg H;Biederman H;Slavinska D et al.[J].Vacuum,1998,50:27. |
| [28] | Stundzia V;Bilkova P;Biederman H et al.[J].Vacuum,1998,50:23. |
| [29] | Biederman H;Stundzia V;Slavinska D et al.[J].Thin Solid Films,1999,351:151. |
| [30] | Biederman H;Bilkova P;Jezek J;Hlidek P;Slavinska D .RF magnetron sputtering of polymers[J].Journal of Non-Crystalline Solids: A Journal Devoted to Oxide, Halide, Chalcogenide and Metallic Glasses, Amorphous Semiconductors, Non-Crystalline Films, Glass-Ceramics and Glassy Composites,1997(0):44-49. |
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