采用脉冲电沉积技术，在室温下的含YCl3和NiCl2的二甲基亚砜(DMSO)溶液中，沉积出 含稀土元素Y的Y-Ni合金薄膜。研究了影响镀层性能的工艺参数，包括脉冲频率、占空比、 电流效率及Y在镀层中的含量与电流密度的关系，用X射线分析仪确定镀层的物相组成，用扫 描电镜及能谱仪分析了合金镀层的组成及形态。发现，随着电流密度增大，合金镀层中的稀 土Y含量增高。Y-Ni合金薄膜具有非晶态结构，具有良好的耐蚀性和一定的抗氧化性。
Cailiao baohu 2001, 34(2), 19∽ 20(Ch). The pulse electrodeposition of Y-Ni alloy functional film in YCl3-NiCl2-DMSO solution at room temperature was studied. It showed that the various grey rare earth alloy films with metallic lustre could be prepared by pulse plating in DMSO solution at 5～ 15 mA/cm2 current density.
参考文献
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