本文采用单源真空蒸发法制备了ZnSe薄膜,利用电子探针、X射线粉晶衍射等现代测试手段研究了蒸发温度(700～1050 ℃)、基片温度(0～200 ℃)、基片材料(单晶硅、玻璃)以及热处理温度(300～400 ℃)等因素的改变对ZnSe薄膜的成份和结构的影响规律,建立了单源真空蒸发沉积ZnSe薄膜及热处理的实验方法.
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