用射频磁控溅射法在c-BN晶体基底上生长c-BN薄膜

1.吉林大学超硬材料国家重点实验室,长春,130023

2.吉林大学超硬材料国家重点实验室,长春,130023

3.吉林大学超硬材料国家重点实验室,长春,130023

4.吉林大学超硬材料国家重点实验室,长春,130023

5.吉林大学超硬材料国家重点实验室,长春,130023

6.吉林大学超硬材料国家重点实验室,长春,130023

7.吉林大学超硬材料国家重点实验室,长春,130023

8.吉林大学超硬材料国家重点实验室,长春,130023

9.吉林大学超硬材料国家重点实验室,长春,130023

Growth of Cubic Boron Nitride Thin Film on c-BN Crystal Substrate by RF Magnetron Sputtering

本文用射频磁控溅射方法在片状c-BN晶体基底上生长了c-BN薄膜,显微拉曼光谱(μ-RS)和扫描电子显微镜(SEM)测试结果表明:沉积的薄膜是大约10μm厚、高结晶性、电子透明的高纯c-BN薄膜.岛状和层状生长模式在试验中清晰的展示出来.同时在生长的c-BN薄膜内部和被遮盖的基底部分上发现了籽晶.

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