采用磁控溅射法制备了MoS2/Ni复合膜,同时对影响膜层性能的工艺参数进行了初步探讨,并对复合膜进行了成分与结构分析以及摩擦试验.结果表明:在本试验工艺参数(本底真空度为7.0×10-4 Pa,沉积气压为0.5 Pa,溅射功率为160 W,溅射氩气流量为80 cm3/s,靶基距为60 mm,基片温度为70℃)下制备的MoS2/Ni复合膜能够大大降低不锈钢等基底表面的摩擦因数,并且在高速重载的条件下具有更低的摩擦因数和更小的摩擦因数波动值.
参考文献
| [1] | Renevier N M;Fox V C;Teer D G et al.Coating characteristics and tribological properties of sputter-deposited MoS2/metal composite coatings deposited by closed field unbalanced magnetron sputter ion plating[J].Surface and Coatings Technology,2000,127:24-25. |
| [2] | Renevier NM.;Oosterling H.;Konig U.;Dautzenberg H.;Kim BJ.;Geppert L. Koopmans FGM.;Leopold J. .Performance and limitations of MoS2/Ti composite coated inserts[J].Surface & Coatings Technology,2003(1):13-23. |
| [3] | Carrera S.;Salas O.;Moore JJ.;Woolverton A.;Sutter E. .Performance of CrN/MOS2 (Ti) coatings for high wear low friction applications[J].Surface & Coatings Technology,2003(1):25-32. |
| [4] | Renevier N M;Fox V C;Teer D G .Coating characteristics and tribological properties of sputter-deposited MoS2 metal composite coatings deposited by closed field unbalanced magnetron sputter ion plating[J].Surface and Coatings Technology,2000,127:24-37. |
| [5] | 陈焘,郭等柱,万志华,白芝芳.磁控溅射防锈MoS2薄膜沉积工艺研究[J].真空与低温,2002(04):241-245. |
| [6] | 王吉会,张爱平,夏扬.沉积条件对MoS2薄膜生长特性的影响[J].兵器材料科学与工程,2005(04):34-38. |
| [7] | 王培录,刘仲阳,廖小东,孙官清,郑思孝.IBAD MoS2-Ta膜的电子显微与能谱分析[J].核技术,1999(03):143-148. |
| [8] | Spalvins T .A review of recent advances in solid film lubrication[J].Journal of Vacuum Science and Technology,1987,A5(02):212-219. |
| [9] | Fleischauer P D .Effect of crystallite orientation on environmental stability and lubrication properties of sputtered MoS2 thin film[J].ASLE TRANSACTION,1989,27(01):82-88. |
| [10] | 王海斗,刘家浚,徐滨士.复合镀渗MoS2薄膜及其组织性能分析[J].金属热处理,2004(04):29-32. |
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