酸性镀液中以硼酸为缓冲剂、柠檬酸三钠为配合剂,在紫铜箔上电沉积得到非晶Fe-Ni-s合金薄膜.采用扫描电子显微镜和能谱分析技术(EDS)研究了镀液组成和沉积条件对镀层表面形貌和组成的影响.结果表明,在镀液中加入2 g/L C2H5O3NS(糖精)和0.4 g/L 1,4-丁炔二醇可获得表面平整无裂缝和较小内应力的合金镀层;电流密度和镀液pH值对镀层组成影响较小,但施镀温度对镀层组成影响较大.获得了理想的镀液组成和沉积条件,所得Fe73Ni95S175薄膜的X射线衍射表明其为非晶结构,在室温下具有较高的饱和磁化强度(Ms约为876.25 kA/m)和较低的矫顽力(Hc约为4.96 kA/m),具有良好的软磁性能.循环伏安曲线和阴极极化曲线均表明,镀液中CS(NH2)2会促进Fe-Ni-S共沉积.
参考文献
[1] | Wang S L,Hong L L.Effect of the Heat Treatment on the Structure and the Properties of the Electroless Co-Fe-B Alloy[J].J Alloys Compd,2007,429:99-103. |
[2] | Huang G F,Huang W Q,Wang L L,et al.Electrochemical Study of Electroless Deposition of Fe-P Alloys[J].Electrochim Acta,2006.51(1):4471-4476. |
[3] | LIU Tiancheng,LU Zhichao,LI Deren,et al.Effect of Heat Treatment on Microstructure and Magnetic Properties of Fe-Ni Alloy Film[J].Trans Mater Heat Treat,2007,28(6):1-5(in Chinese).刘天成,卢志超,李德仁,等.热处坪温度对Fe-Ni合金薄膜微结构及磁性的影响[J].材料热处理学报,2007,28(6):1-5. |
[4] | Freitag W O,Mathas J S,DiGuilio G.The Electrodepesition of Nickel-iron-phosphorus Thin Films for Computer Memory Use[J].J Electrochem Soc,1964,111:35-39. |
[5] | Han Q,Liu K R,Chen J S,et al.Study of Amorphous Ni-S-Co Alloy Used as hydrogen evolution reaction Cathode in Alkaline Medium[J].Int J Hydrogen Energy,2004,29:243-247. |
[6] | Vandenborre H,Vermeiren Ph,Leysen R.Hydrogen Evolution at Nickel Aulphide Cathodes in Alkaline Medium[J].Electrochim Acta,1984,29:297-301. |
[7] | Hine F,Yasuda M,Watanabe M.Studies of the Nickel-sulfur Eleetrodeposited Cathode[J].Denki Kagaku,1979,47:400-404. |
[8] | Du Min,GAO Rongjie,WEI Xunjun.Hydrogen Evolution Reaction of Ni-S Electrodepesited Cathode[J].Chinese J Power Sources,2001,25(3):223-224(in Chinese).杜敏,高荣杰,魏绪钧.电沉积Ni-S合金阴极析氢反应[J].电源技术,2001,25(3):223-224. |
[9] | Sabela R.Paseka I.Properties of Ni-Sx Electrodes for Hydrogen Evolution from Alkaline Medium[J].J Appl Electrochem,1990,20:500-505. |
[10] | Sulitanu N,Br(i)nzǎ F.Electrodeposited Ni-Fe-S Films with High Resistivity for Magnetic Recording Device[J].J Optoelectron Adv Mater,2004,6(2):641-645. |
[11] | JIANG Yanping,PAN Yong,ZHOU Yichun.Residual Stress and Its Redistribution Induced by Laser Beam Thermal Shock in Electrodeposited Nickel Coatings[J].J Xiangtan Univ Nat Sci,2004,26(1):49-54(in Chinese).蒋艳平,潘勇,周益春.电沉积镍涂层中的残余应力及激光热冲击的影响[J].湘潭大学自然科学学报,2004,26(1):49-54. |
[12] | LIU Yichun,LIU Lei,SHEN Bin,et al.Study on Irorr-nickel lnvar Alloy Prepared by Electrodeposition[J].Electroplat Finish,2009,28(5):9-12(in Chinese).刘意春,刘磊,沈彬,等.电沉积制备铁-镍因瓦合金的工艺究[J].电镀与涂饰,2009,28(5):9-12. |
[13] | Wen T C,Lin S M,Tsai J M.Sulfur Content and the Hydrogen Evolution Activity of NiSx Deposits Using Statistical Experimental Strategies[J].J Appl Electrochem,1994,24(3):233-238. |
上一张
下一张
上一张
下一张
计量
- 下载量()
- 访问量()
文章评分
- 您的评分:
-
10%
-
20%
-
30%
-
40%
-
50%