研究了质子辐照对多层膜巨磁电阻结构磁性能的影响.利用5 MeV的不同辐照剂量和剂量率的质子对磁控溅射法制备的CoFe/(CoFe/Cu) 10/CoFe/Ta多层膜巨磁电阻结构进行辐照实验.XRD分析表明质子辐照没有改变CoFe/Cu的晶格结构.分析磁滞回线和磁电阻曲线得知在实验选取的辐照剂量范围内,饱和磁化强度和本征电阻随着辐照剂量的增加而增加,而矫顽场和磁电阻率随剂量的增加而减小.利用质子辐照对自旋相关散射、平均自由程的影响解释了本征电阻的变化,并基于二流体模型对磁电阻率的变化进行了分析.由此得出,多层膜巨磁电阻结构具有一定的抗辐照能力.
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