采用多靶磁控溅射技术,分别利用不同V靶功率和石墨靶功率制备一系列不同V含量和C含量的TiVN和TiVCN 复合膜.利用X射线衍射仪、纳米压痕仪,高温摩擦磨损仪研究了TiVN和TiVCN复合膜的微结构、力学性能及室温和高温摩擦磨损性能.研究表明,当V靶功率为60 W时,TiVN薄膜的硬度达到最大值,为25.02GPa.在此基础上逐渐加入C元素,当石墨靶功率为20 W时,TiVCN薄膜的硬度达到最大值,为28.51GPa.当石墨靶功率进一步增加,薄膜的硬度值开始逐渐降低.室温下,随着石墨靶功率的增加,TiVCN薄膜的摩擦系数逐渐减小.高温下,TiVCN复合膜的摩擦系数随着温度的升高先增加后减小,在700℃时获得最小值,当温度继续升高摩擦系数又增加.讨论了高温下TiVCN复合膜Magnéli相的作用和自适应机制.
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