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用气相方法在较低的温度(900℃)下在单晶硅基片表面制备出金属钨的单晶纳米线阵列,用扫描电子显微镜(SEM)、透射电子显微镜(TEM)和X-ray衍射(XRD)等手段对其进行了分析和表征.结果表明:在900℃制备的阵列单晶钨纳米线沿<111>方向生长,具有bcc结构,直径约为150 nm,长度为10-30 μm.

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