提出了两类用于制备晶粒有序Si基纳米发光材料的方案.一种是利用固体表面预成核位置的有序化,如台阶表面、再构表面、吸附表面以及图形表面等加以实现.另一种则是通过控制自组织生长成核过程的有序性,如退火诱导晶化、引入埋层应变、异种原子掺杂以及分子自组装等加以实现.评论了这些制备方法的最新进展,并展望了它的未来发展趋势.
参考文献
[1] | YCPeng, XWZhao, GSFu, Chinese Science Bulletin, 47(15), 1233(2002) |
[2] | LMitas, JTherrien, RTwesten, GBelomin, HNayfeh, Appl Phys Lett, 78(13), 1918(2001) |
[3] | AGMakarov, NNLedentsov, AFTsatsul' nikov, GECirlin, VAEgorov, VMUstinov, NDZakharov,P Werner, Semiconductor, 37(2), 210(2003) |
[4] | NMotta, ASgarlata, FRosei, PDSzkutnik, SNufirs, MScarselli, ABalzarotti, Mater Sci Eng, B101,77(2003) |
[5] | GJin, JLLiu, KLWang, Appl Phys Lett, 76(24), 3591(2000) |
[6] | LVescan, TStoica, J Appl Phys, 91(12), 10119(2002) |
[7] | HOmi, DJBottomley, YHomma, TOgino, Physical Review, B67, 115302-1(2003) |
[8] | DJBottomley, HOmi, YKobayashi, MUematsu, HKagshima, TOgino, Phys Rev, B66(3), 035301-1(2002) |
[9] | MKawamura, NPaul, VCherepanov, BVoigtlander, Phys Rev Lett, 91(9), 696102-1(2003) |
[10] | TKanayama, MWatanabe, LBolotov, NUchida, J Vac Sci Technol, B18(6), 3497(2000) |
[11] | HMori, HNagai, TYanagawa, SMatsumoto, Mater Sci Eng, B89, 188(2002) |
[12] | HRauscher, JBraun, RJBehm, Appl Phys A, 76, 712(2003) |
[13] | SMiyazaki, YHamamoto, EYoshida, MIkeda, MHirose, Thin Solid Films, 369, 55(2000) |
[14] | YHirano, FSato, SAihara, NSaito, SMiyazaki, MHirose, Appl Phys Lett, 79(14), 2255(2001) |
[15] | PENG Yingcai, SMiyazaki, MIkeda, Acta Physica Sinica, 52(12), 3108(2003)(彭英才,宫崎诚一,池田弥央,物理学报,52(12),3108(2003)) |
[16] | HShirai, YFujimura, SJung, Thin Solid films, 407, 12(2002) |
[17] | TYasuda, MNishizawa, SYamasaki, Appl Phys Lett, 76(22), 3203(2000) |
[18] | NMiyata, HWatanabe, MIchikawa, Appl Phys Lett, 77(11), 1620(2000) |
[19] | MZacharias, JHeitmann, RScholz, UKahler, MSchmidt, JBlasing, Appl Phys Lett, 80(4), 661(2002) |
[20] | TMuller, KHHeinig, WMoller, Appl Phys Lett, 81(16), 3049(2002) |
[21] | LKhriachtchev, SNovikov, JLahtinen, Appl Phys, 92(10), 5856(2002) |
[22] | DNesheva, CRaptis, APerakis, IBineva, ZAneva, ZLevi, SAlexandrova, HHofmeister, J AppL Phy s,92(8), 4678(2002) |
[23] | SUI Yanping, MA Zhongyuan, CHEN Kunji, LI Wei, XU Jun, HUANG Xinfan, Acta Physica Sinica, 52(4),989(2003)(隋妍萍,马忠元,陈坤基,李伟,徐骏,黄信凡,物理学报,52(4),989(2003)) |
[24] | NUsami, MMiura, YIto, YAraki, YShiraki, Appl Phys Lett, 76(25), 3723(2000) |
[25] | MMiura, JMHartmann, JZhang, BJoyce, YShiraki, Thin Solid Films, 369, 104(2000) |
[26] | HTakamiya, MMiura, JMitsui, SKoh, THattori, YShiraki, Mater Sci Eng, B89, 58(2002) |
[27] | MHerbst, CSchramm, KBrunner, TAsperger, HRridel, GAbstreiter, AVorckel, HKurz, EMuller, MaterSci Eng, B89, 54(2002) |
[28] | P Boucaud, VLThanh, VYam, SSauvage, NMeneceur, MElkurdi, DDebarre, Mater Sci Eng, B89, 362002 |
[29] | MDerivaz, P Noe, JLRouviere, DButtrard, DSotta, P Gentil, ABarski, Mater Sci Eng, B89, 191(2002) |
[30] | OLeifeld, ABeyer, DGrutzmacher, KKern, Phys Rev, B66(12), 125312-1(2002) |
[31] | XWZhao, SKomuro, SFujita, HIsshiki, YAoyagi, TSugano, Mater Sci Eng, B51, 154(1998) |
[32] | FCYnan, GZRan, YChen, LDai, YPQiao, ZCMa, WHZong, GGQin, Thin Solid Fims, 409, 194(2002) |
[33] | TMakimura, KKondo, UUematsu, CQLi, KMurakami, Appl Phys Lett, 83(26), 5422(2003) |
[34] | WLNg, MALourenc, RMGwilliam, SLedain, KP Homewood, Nature, 410, 192(2001) |
[35] | FIacona, DPacifici, AIrrera, MMiritello, GFranzo, FPriolo, DSanfilippo, GDStefano, PGFallica, ApplPhys Lett, 81(17), 3242(2002) |
[36] | YKusumi, KFujita, MIchikawa, J Appl Phys, 83(11), 5890(1998) |
[37] | QWan, THWang, WLLiu, CLLin, J Crystal Growth, 249, 23(2003) |
[38] | MHuang, THYang, GLLuo, EYChang, Jpn J Appl Phys, 42(6B), L718(2003) |
[39] | ZHU Jing, Nanomaterials and Devices (Beijing, Qinghua University Press, 2003) p429~445(朱静,纳米材料与器件(北京,清华大学出版社,2003)p429~445) |
[40] | HUANG Changjun, YU Jinzhong, WANG Qiming, Progress in Natrual Science, 14(1), 28(2004)(黄昌俊,余金中,王启明,自然科学进展,14(1),28(2004)) |
[41] | LZhang, KChen, XHuang, LWang, JXu, WLi, Appl Phys, A77, 485(2003) |
[42] | AJPedraza, JDFowlkes, YFGuan, Appl Phys, A77, 277(2003) |
[43] | YCPeng, GSFu, WYu, SQLi, YLWang, Semicond Sci Technol, (2004)(in press) |
[44] | ERogozhina, GBelomoin, ASmith, LAbuhassan, NBarry, OAkcarkir, PVBraun, MHNayfeh, ApplPhys Lett, 278(23), 3711(2001) |
[45] | SSato, NYamamoto, KNakanishi, Jpn J Appl Phys, 42(6A), L616(2002) |
上一张
下一张
上一张
下一张
计量
- 下载量()
- 访问量()
文章评分
- 您的评分:
-
10%
-
20%
-
30%
-
40%
-
50%