用非平衡磁控溅射的方法在室温下制备了光滑、均匀、致密的类金刚石(DLC)薄膜,分析和研究了DLC膜的形貌、结构和摩擦特性.结果表明,靶工作电流对DLC膜的沉积有重要的影响.随着工作电流的增大,薄膜的沉积速率增大,薄膜中sp3键的含量增加.薄膜的摩擦系数随着工作电流的增加略有增大,在摩擦的初始阶段,摩擦系数较高,随着摩擦循环次数的增加,摩擦系数逐渐减小,并逐渐趋于稳定.
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