用永磁体环形磁场直拉(PMCZ)炉代替普通的MCZ炉生长了质量较高的单晶硅在PMCZ炉中水平辐射状磁力线均匀分布,可有效地抑制熔体中不规则的对流和固液界面处的温度波动,降低以至消除微观生长速率的起伏.在用PMCZ法生长的硅晶体中氧浓度较低,杂质的径向分布均匀性好简单地讨论了PMCZ法控氧优于普通MCZ法的机理.
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