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介绍了一种新的脉冲激光真空弧沉积技术,利用该技术在硅基片上制备了类金刚石薄膜.利用激光拉曼分析技术对沉积膜进行了结构分析,结果表明沉积膜为非晶结构,具有明显的sp3结构特征.同时利用纳米划痕压痕仪、原子力显微镜等分析设备对膜的表面形貌、微观摩擦学性能进行了分析,结果表明Si〈100〉基片上沉积膜的表面形貌和微观摩擦学性能略优于Si〈111〉基片上沉积的薄膜,其摩擦系数平均值为0.036.

参考文献

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