基于平界面溶质扩散假设,改进界面物质守恒边界条件求得了层片共晶稳态生长的溶质边界层.结果表明,层片共晶组织生长过程中沿生长方向的溶质边界层与沿界面方向的溶质边界层相关.对CBr4-C2Cl6透明合金系的分析表明,共晶合金层片组织生长过程中界面处液、固相平均成分的差值随凝固速率增大而增大.合金成分偏离共晶成分时,界面处液相平均成分与共晶成分非常接近.在给定的凝固速率下,共晶相界面处液、固相平均成分差值与层片宽度的比值随合金成分的不同而不同.
参考文献
[1] | Hunt J D.Sci Technol Adv Mater,2001; 2:147 |
[2] | Karma A,Plapp M.JOM,2004; 56:28 |
[3] | Jackson K A,Hunt J D.Trans AIME,1966; 236:1129 |
[4] | Ma D,Jie W Q.Acta Metall Sin,1996; 32:791;(马东,介万奇.金属学报,1996;32:791) |
[5] | Datye V,Langer J S.Phys Rev,1981; 24B:4155 |
[6] | Ginibre M,Akamatsu S,Faivre G.Phys Rev,1997; 56E:780 |
[7] | Magnin P,Kurz W.In:Stefanescu D M ed,Metals Hundbook Vol.15 Casting.Metals Park,OH:ASM international,1988:119 |
[8] | Tiller W A,Jackson K A,Rutter J W,Chalmers B.Acta Metall,1953; 1:428 |
[9] | Hunt J D.J Cryst Growth,1968; 3-4:82 |
[10] | Hunt J D,Shu-Zu Lu,In:Hurle D T.J ed.Handbook of Crystal Growth.Vol.2,Part B:Bulk Crystal Growth:Growth Mechanism and Dynamics,Amsterdam:North Holland,1994:1111 |
[11] | Wilcox W R,Gegel L L.Acta Astronaut,1996; 38:51 |
[12] | Ma D,Li Y,Ng S C.J Cryst Growth,2000; 219:300 |
[13] | Derby B,Favier J J.Acta Metall,1983; 31:1123 |
[14] | Stocker C,Ratke L.J Cryst Growth,2000; 212:324 |
[15] | Han S H,Trivedi R.Metall Mater Trans,2000; 31A:1819 |
[16] | Karma A,Rappel W J,Fuh B C,Trivedi R.Metall Mater Trans,1998; 29A:1457 |
[17] | Kerr H W,Kurz W.Int Mater Rev,1996; 41:129 |
[18] | Liu J C,Elliott R.Acta Metall Mater,1995; 43:3301 |
[19] | Akamatsu S,Plapp M,Faivre G,Karma A.Phys Rev,2002; 66E:030501(R) |
[20] | Series R W,Hunt J D,Jackson K A.J Cryst Growth,1977; 40:221 |
[21] | Catalina A V,Sen S,Stefanescu D M.Metall Mater Trans,2003; 34A:383 |
[22] | Magnin P,Trivedi R.Acta Metall Mater,1991; 39:453 |
[23] | Seetharaman V,Trivedi R.Metall Trans,1988; 19A:2955 |
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