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合金高温氧化时在氧化膜/合金界面处常出现孔洞,显著地削弱氧化膜的黏附力研究了1000℃氧化后Fe-40%Al合金/氧化膜处孔洞的生成过程,并测定孔洞数量与体积随氧化时间的变化将经不同时间氧化试样表面形成的氧化膜揭去后,用扫描电子显微镜和原子力显微镜测定界面处孔洞的大小和深度.同时基于氧化过程中产生的空位全部聚集形成孔洞的考虑,计算了形成孔洞的总量.把实验结果与理论计算进行比较,讨论了氧化膜/合金界面处孔洞形成的机制.

参考文献

[1] Pint B. Oxid Met, 1997: 48:303
[2] Grabke H J, Wiemer D, Viefhaus H. Appl Surf Sci, 1991:47:243
[3] Dravnieks A, McDonald H J. J Electrochem Soc, 1948: 94: 139
[4] Harris J E. Acta Metall, 1978: 26:1033
[5] Kumar A, Nasrallah M, Douglass D L. Oxid Met, 1974: 8:227
[6] Smialek J L, Doychak J, Gaydosh D J. Oxid Met, 1990:34:259
[7] Xu C H, Gao W, Gong H. High Temp Mater and Proc,2000: 19:371
[8] Hou P Y. Mater Sci Forum, to be published
[9] Rommerskirchen I, Eltester B, Grabke H J. Mater Corr, 1996: 47:646
[10] Brumm M W, Grabke H J. Corr Sci, 1992: 33:1677
[11] Brumm M W, Grabke H J. Corr Sci, 1993: 34:547
[12] Halden F A, Kingery W D. J Phys Chem, 1955: 59:557
[13] ChangYA, PikeLM, LiuC T, BilbreyA R, StoneD S. Intermetallics, 1993: 1:107
[14] Hutchings R, Loretto M H, Smallman R E. Met Sci, 1981: 15:7
[15] Hou P Y, Niu Y, Van Lienden C. Oxid Met, to be pub lished
[16] Gesmundo F, Hou P Y. Oxid Met, to be published
[17] Reddy K P R, Smialek J L, Cooper A R. Oxid Met, 1982: 17:429
[18] Jedlinski J, Borchardt G. Oxid Met, 1991: 36:317
[19] Schumann E, Yang J C, Ruhle M, Graham M J. Mater Corr, 1996: 47:631
[20] Mehrer H, Eggersmann N, Gude A, Salamon M, Sepiol B. Mater Sci Eng, 1997: A239-240:889
[21] Mehrer H. Mater Trans, JIM, 1996: 37:1259
[22] Evans A G, Crumley G B, Demaray R E. Oxid Met, 1983: 20:193
[23] Wright J K, Williamson R L, Hou P Y, Cannon R M, Renusch D, Veal B, Grimsditch M. In Hou P Y, McNallan M J, Oltra R, Opila E J, Shores D A eds. High Temperature Corrosion and Materials Chemistry, Electrochem. Soc, 1998:53
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