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采用磁控溅射方法在Si-(111)基片上沉积 Au/NiCr/Ta多层金属膜利用XRD分析晶体取向,SEM观察表面和断面形貌,AFM研究表面粗糙度,纳米压入研究薄膜硬度.结果表明薄膜表面粗糙度依赖于基体沉积温度,并且影响薄膜电阻和纳米硬度.

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