探究HfO2薄膜的激光损伤特性以进一步提高激光损伤阈值(Laser Induced Damage Threshold,简称LIDT),对其在高功率激光系统中的广泛应用具有重要的意义.在不同的离子源偏压下,采用等离子体辅助电子束蒸发金属铪(Hf)并充氧(O2)进行反应沉积法制备了中心波长为1064 nm,光学厚度为4H的HfO2薄膜样品.测试了薄膜组分和残余应力;根据透射谱拟合了薄膜的折射率;通过XRD谱图和SEM表面形貌图分析了薄膜的微观结构;对激光损伤阈值、损伤特性和机理进行了论述.结果表明:偏压100 V时制备的薄膜具有最佳O/H-f配比;薄膜压应力和折射率均随偏压降低而减小.薄膜内存在结晶,激光能量在晶界缺陷处被强烈聚集和吸收,加速了膜层的破坏,形成由几百纳米的烧灼坑聚集而成的海绵状损伤结构.随着偏压降低,膜结晶取向由((1)11)晶面向(002)晶面转变,界面能降低;晶粒减小,结构更均匀,缓解了激光能量在晶界处的局部聚集与吸收,表现出较大的激光损伤阈值.
参考文献
| [1] | Meiping Zhu;Kui Yi;Zhengxiu Fan;Jianda Shao.Theoretical and experimental research on spectral performance and laser induced damage of Brewster's thin film polarizers[J].Applied Surface Science: A Journal Devoted to the Properties of Interfaces in Relation to the Synthesis and Behaviour of Materials,201115(15):6884-6888. |
| [2] | A. Callegari;E. Cartier;M. Gribelyuk;H. F. Okorn-Schmidt;T. Zabel.Physical and electrical characterization of Hafnium oxide and Hafnium silicate sputtered films[J].Journal of Applied Physics,200112(12):6466-6475. |
| [3] | M. Ramzan;M.F. Wasiq;A.M. Rana;S. Ali;M.Y. Nadeem.Characterization of e-beam evaporated hafnium oxide thin films on post thermal annealing[J].Applied Surface Science: A Journal Devoted to the Properties of Interfaces in Relation to the Synthesis and Behaviour of Materials,2013Oct.15(Oct.15):617-622. |
| [4] | Alvisi M.;Marrone SG.;Perrone MR.;Protopapa ML. Valentini A.;Vasanelli L.;Di Giulio M..HfO2 films with high laser damage threshold[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,20001/2(1/2):250-258. |
| [5] | Meiping Zhu;Kui Yi;Detlef Arhilger;Hongji Qi;Jianda Shao.Effect of Advanced Plasma Source bias voltage on properties of HfO_2 films prepared by plasma ion assisted electron evaporation from metal hafnium[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,2013Jul.1(Jul.1):17-22. |
| [6] | Wu SG;Tian GL;Xia ZL;Shao JD;Fan ZX.Influence of negative ion element impurities on laser induced damage threshold of HfO2 thin film[J].Applied Surface Science: A Journal Devoted to the Properties of Interfaces in Relation to the Synthesis and Behaviour of Materials,20063(3):1111-1115. |
| [7] | C.Y. Ma;W.J. Wang;J. Wang;C.Y. Miao;S.L. Li;Q.Y. Zhang.Structural, morphological, optical and photoluminescence properties of HfO_2 thin films[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,2013Oct.31(Oct.31):279-284. |
| [8] | M. Alvisi;F. De Tomasi;M. R. Perrone;M. L. Protopapa;A. Rizzo;F. Sarto;S. Scaglione.Laser damage dependence on structural and optical properties of ion-assisted HfO{sub}2 thin films[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,20011/2(1/2):44-52. |
| [9] | 牛燕雄;张鹏;姚建铨;段晓峰;汪岳峰;郭丽.强激光对星载光电探测系统的干扰与破坏研究[J].光子学报,2004(7):793-796. |
| [10] | 马平;陈松林;胡建平;胡江川;段立华;王震;邵建达;范正修.不同沉积参量下ZrO2薄膜的微结构和激光损伤阈值[J].光学学报,2005(7):994-998. |
| [11] | Microscopic mechanisms of ablation and micromachining of dielectrics by using femtosecond lasers[J].Applied physics letters,200324(24):4382-4384. |
| [12] | 艾万君;熊胜明.单层二氧化铪（HfO2）薄膜的特性研究[J].光电工程,2012(2):134-140. |
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