为更好的理解困扰电感耦合等离子质谱仪(ICP-MS)分析灵敏度提高的基质干扰问题,利用激光诱导荧光技术,考察了钡离子和钙离子在ICP-MS取样锥后的质量控制传递行为.通过比较分析离子在取样锥孔口及后端的径向分布,探讨了ICP功率、雾化气流速及基质干扰对取样锥后分析离子空间分布的影响.结果表明:取样锥孔口钙离子与钡离子分布类似,但取样锥后扩散状况与其相对原子质量有关,相对原子质量小的元素径向扩散更快,因此仪器检测灵敏度较低;雾化气流速越大,分析离子的传递效率越低,因此更高的进样速率在ICP-MS应用中不一定对应更高的检测灵敏度;分析离子径向分布及数量也受基质组分影响,基质干扰降低了取样锥后中心轴线上的分析离子数量,使其径向分布变得更扁平,通过截取锥的概率更低,最终使得分析离子的信号降低.
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