以甲苯-2,4-二氨基甲酸甲酯(2,4-TDC)为分子探针模型,构建了一种新的评价金红石二氧化钛颜料紫外屏蔽性能的反应体系,系统地考察了反应条件对分子探针光降解的影响,并对一系列二氧化钛颜料紫外屏蔽性能进行了对比研究.结果表明,金红石二氧化钛作用下,2,4-TDC光降解过程符合一级反应动力学;随着二氧化钛颜料用量的增加,2,4-TDC光降解速率常数呈现指数次下降趋势;紫外光照下表面包覆的金红石二氧化钛颜料不能完全抑制·OH和h+活性物种的产生.根据2,4-TDC的光降解速率常数,能体现一系列工业金红石二氧化钛颜料紫外屏蔽性能差异.该方法具有条件温和、操作简便、实验周期短、结果重现性好等优点,将在二氧化钛颜料的紫外屏蔽性能测试中具有潜在的应用价值.
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