研究了加H2对SiH4/N2/Ar高密度、低离子能量的等离子体淀积的氮化硅薄膜(淀积的衬底温度为400℃)电学和光学性能的影响.实验结果表明,加入H1使氮化硅薄膜的光学带隙增加,其折射率以及在氢氟酸缓冲液中腐蚀速率减小,而XPS测试的N、Si原子比没有改变,均为1.3.FTIR测量表明,样品中Si-H键的密度低于仪器检测限,而添加H2的样品中N-H键密度稍增加.此外,由淀积的氮化硅膜构成的MIS结构的高频C-V测试(1 MHz)显示,当氢气流量从零增加到8 sccm时,高频C-V的回滞幅度从(0.40土0.05)V降低到(0.10士0.01)V.基于这些实验结果和理论分析,表明了加适量H2能够促进弱的Si-Si键以及Si和N的悬挂键向Si-N键转化.
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