欢迎登录材料期刊网

材料期刊网

高级检索

参考文献

[1] Kumar V,Lu W,Schwindt R,et al.AlGaN/GaN HEMTs on SiC with fT of over 120 GHz.IEEE Electron Device Lett,2002,23(8):455
[2] Wang Zhigang,Chen Wanjun,Zhang Bo,et al.A novel controllable hybrid-anode AlGaN/GaN field-effect rectifier with low operation voltage.Chin Phys Lett,2012,29(10):107202
[3] Yang Ling,Hao Yue,Ma Xiaohua,et al.Various recipes of SiNx passivated AlGaN/GaN high electron mobility transistors in correlation with current slump.Chin Phys Lett,2009,26(11):117104
[4] Cheng Zhiqun,Liu Jie,Zhou Yugang,et al.Broadband microwave noise characteristics of high-linearity compositechannel Al0.3Ga0.7N/Al0.05Ga0.95N/GaN HEMTs.IEEE Electron Device Lett,2005,26(8):145
[5] Xing H,Dora Y,Chini A,et al.High breakdown voltage AlGaN-GaN HEMTs achieved by multiple field plates.IEEE Electron Device Lett,2004,25(4):161
[6] Karmalkar S,Mishra U K.Enhancement of breakdown voltage in AlGaN/GaN high electron mobility transistors using a field plate.IEEE Electron Device Lett,2001,48(8):1515
[7] Zhang N Q,Keller S,Parish G,et al.High breakdown GaN HEMT with overlapping gate structure.IEEE Electron Device Lett,2000,21(9):421
[8] Kim Y S,Lim J,Seok O G,et al.High breakdown voltage Al-GaN/GaN HEMT by employing selective fluoride plasma treatment.Power Semiconductor Devices and ICs (ISPSD).IEEE 23rd Intemational Symposium,2011:251
[9] Song Di,Liu Jie,Cheng Zhiquan,et al.Normally offAlGaN/GaN low-density drain HEMT (LDD-HEMT) with enhanced breakdown voltage and reduced current collapse.IEEE Electron Device Lett,2007,28:189
[10] Chen Xingbi.Lateral high-voltage semiconductor devices with surface covered by thin film of dielectric material with high permittivity.USA Patent,No.6936907,2005,Aug.30
[11] Li Junhong,Li Ping,Huo Weirong,et al.Analysis and fabrication of an LDMOS with high-permittivity dielectric.IEEE Electron Device Lett,2011,33(9):1266
[12] Karmalkar S,Shur M S,Simin G,et al.Field-plate engineering for HFETs.IEEE Electron Device Lett,2005,52(12):2534
[13] Hampson M D,Shen S C,Schwindt R S,et al.Polyimide passivated AlGaN/GaN HFETs with 7.65 W/mm at 18 GHz.IEEE Electron Device Lett,2004,25:238
[14] Tian B,Chen C,Zhang J,et al.Structure and electrical characteristics ofAlGaN/GaN MISHFET with Al2O3 thin film as both surface passivation and gate dielectric.Semicond Sci Technol,2011,26:085023
[15] Tan I H,Sinder G L,Hu E L.A self-consistent solution of Schr(o)dinger-Poisson equations using a nonuniform mesh.J Appl Phys,1990,68(8):4071
上一张 下一张
上一张 下一张
计量
  • 下载量()
  • 访问量()
文章评分
  • 您的评分:
  • 1
    0%
  • 2
    0%
  • 3
    0%
  • 4
    0%
  • 5
    0%