参考文献
[1] | Kumar V,Lu W,Schwindt R,et al.AlGaN/GaN HEMTs on SiC with fT of over 120 GHz.IEEE Electron Device Lett,2002,23(8):455 |
[2] | Wang Zhigang,Chen Wanjun,Zhang Bo,et al.A novel controllable hybrid-anode AlGaN/GaN field-effect rectifier with low operation voltage.Chin Phys Lett,2012,29(10):107202 |
[3] | Yang Ling,Hao Yue,Ma Xiaohua,et al.Various recipes of SiNx passivated AlGaN/GaN high electron mobility transistors in correlation with current slump.Chin Phys Lett,2009,26(11):117104 |
[4] | Cheng Zhiqun,Liu Jie,Zhou Yugang,et al.Broadband microwave noise characteristics of high-linearity compositechannel Al0.3Ga0.7N/Al0.05Ga0.95N/GaN HEMTs.IEEE Electron Device Lett,2005,26(8):145 |
[5] | Xing H,Dora Y,Chini A,et al.High breakdown voltage AlGaN-GaN HEMTs achieved by multiple field plates.IEEE Electron Device Lett,2004,25(4):161 |
[6] | Karmalkar S,Mishra U K.Enhancement of breakdown voltage in AlGaN/GaN high electron mobility transistors using a field plate.IEEE Electron Device Lett,2001,48(8):1515 |
[7] | Zhang N Q,Keller S,Parish G,et al.High breakdown GaN HEMT with overlapping gate structure.IEEE Electron Device Lett,2000,21(9):421 |
[8] | Kim Y S,Lim J,Seok O G,et al.High breakdown voltage Al-GaN/GaN HEMT by employing selective fluoride plasma treatment.Power Semiconductor Devices and ICs (ISPSD).IEEE 23rd Intemational Symposium,2011:251 |
[9] | Song Di,Liu Jie,Cheng Zhiquan,et al.Normally offAlGaN/GaN low-density drain HEMT (LDD-HEMT) with enhanced breakdown voltage and reduced current collapse.IEEE Electron Device Lett,2007,28:189 |
[10] | Chen Xingbi.Lateral high-voltage semiconductor devices with surface covered by thin film of dielectric material with high permittivity.USA Patent,No.6936907,2005,Aug.30 |
[11] | Li Junhong,Li Ping,Huo Weirong,et al.Analysis and fabrication of an LDMOS with high-permittivity dielectric.IEEE Electron Device Lett,2011,33(9):1266 |
[12] | Karmalkar S,Shur M S,Simin G,et al.Field-plate engineering for HFETs.IEEE Electron Device Lett,2005,52(12):2534 |
[13] | Hampson M D,Shen S C,Schwindt R S,et al.Polyimide passivated AlGaN/GaN HFETs with 7.65 W/mm at 18 GHz.IEEE Electron Device Lett,2004,25:238 |
[14] | Tian B,Chen C,Zhang J,et al.Structure and electrical characteristics ofAlGaN/GaN MISHFET with Al2O3 thin film as both surface passivation and gate dielectric.Semicond Sci Technol,2011,26:085023 |
[15] | Tan I H,Sinder G L,Hu E L.A self-consistent solution of Schr(o)dinger-Poisson equations using a nonuniform mesh.J Appl Phys,1990,68(8):4071 |
上一张
下一张
上一张
下一张
计量
- 下载量()
- 访问量()
文章评分
- 您的评分:
-
10%
-
20%
-
30%
-
40%
-
50%