We propose a dynamic threshold voltage junctionless tunnel FET (DT-JLTFET) in which the threshold voltage can be dynamically adjusted,resulting in higher ON-current.Through 2D numerical simulations,it is presented that the threshold voltage in the DT-JLTFET can be adjusted by applying a voltage to the adjust gate.The impact of the threshold voltage shift on the overall performance of the device is also studied.A comparison is made between the dynamic threshold voltage characteristics of a silicon JLTFET and a Si0.7Ge0.3 source JLTFET.
参考文献
[1] | Riel H;Ionescu A M.Tunnel field-effect transistors as energyefficient electronic switches[J].NATURE,2011479:329. |
[2] | Koswatta S O;Lundstrom M S;Nikonov D E.Performance comparison between p-i-n tunneling transistors and conventional MOSFETs[J].IEEE Transactions on Electron Devices,200956:456. |
[3] | Boucart K;Ionescu A M.Double-gate tunnel FET with high-k gate dielectric[J].IEEE Transactions on Electron Devices,200754:1725. |
[4] | Boucart K;Ionescu A M.Length scaling of the double gate tunnel FET with a high-k gate dielectric[J].Solid-State Electronics,200751:1500. |
[5] | Kim S H;Agarwal S;Jacobson Z A.Tunnel field effect transistor with raised germanium source[J].IEEE Electron Device Lett,201031:1107. |
[6] | Mookerjea S;Datta S.Comparative study of Si,Ge and InAs based steep subthreshold slope tunnel transistors for 0.25 V supply voltage logic applications[A].,2008:47. |
[7] | Pate N;Ramesha A;Mahapatra S.Drive current boosting of ntype tunnel FET with strained SiGe layer at source[J].Microelectronics Journal,200839:1671. |
[8] | Toh E H;Wang G H;Chan L.Device physics and guiding principles for the design of double-gate tunneling field effect transistor with silicon-germanium source heterojunction[J].Applied Physics Letters,200791:243505. |
[9] | Shih C;Chien N D.Sub-10-nm tunnel field-effect transistor with graded Si/Ge heterojunction[J].IEEE Electron Device Lett,201132:1498. |
[10] | Riel H;Moselund K E;Bessire C.InAs-Si heterojunction nanowire tunnel diodes and tunnel FETs[A].,2012:16. |
[11] | Moselund K E;Schmid H;Bessire C.InAs-Si nanowire heterojunction tunnel FETs[J].IEEE Electron Device Lett,201233:1453. |
[12] | Li R;Lu Y;Zhou G.AlGaSb/InAs tunnel field-effect transistor with on-current of 78μA/μm at 0.5 V[J].IEEE Electron Device Lett,201233:363. |
[13] | Schenk A;Rhyner R;Luisier M.Analysis ofSi,InAs,and Si-InAs tunnel diodes and tunnel FETs using different transport models[A].,2011:263. |
[14] | Bhuwalka K K;Sedlmaier S;Ludsteck A K.Vertical tunnel field-effect transistor[J].IEEE Transactions on Electron Devices,200451:279. |
[15] | Chen J;Klaumnzer S;Lux-Steiner M C.Vertical nanowire transistors with low leakage current[J].Applied Physics Letters,200485:1401. |
[16] | Mookerjea S;Mohata D;Mayer T.Temperature-dependent Ⅰ-Ⅴ characteristics of a vertical In0.53Ga0.47As tunnel FET[J].IEEE Electron Device Lett,201031:564. |
[17] | Bhuwalka K K;Schulze J;Eisele I.Performance enhancement of vertical tunnel field-effect transistor with SiGe in the δp+ layer[J].Japanese Journal of Applied Physics,200443:4073. |
[18] | Bhuwalka K K;Schulze J;Eisele I.Scaling the vertical tunnel FET with tunnel bandgap modulation and gate workfunction engineering[J].IEEE Transactions on Electron Devices,200552:909. |
[19] | Bal P;Akram M W;Mondal P.Performance estimation of sub-30 nm junctionless tunnel FET (JLTFET)[J].J Comput Electron,201312:782. |
[20] | Ghosh B;Akram M W.Junctionless tunnel field effect transistor[J].IEEE Electron Device Lett,201334:584. |
[21] | Mondal P;Ghosh B;Bal P.Planar junctionless transistor with non-uniform channel doping[J].Applied Physics Letters,2013102:133505. |
[22] | Bal P;Ghosh B;Mondal P.Dual material gate junctionless tunnel field effect transistor[J].J Comput Electron,201413:230. |
[23] | Assaderaghi F;Sinitsky D;Parke S A.Dynamic thresholdvoltage MOSFET (DTMOS) for ultra-low voltage VLSI[J].IEEE Transactions on Electron Devices,199744:414. |
[24] | He J;Chan M.Numerical study on nanowire tunnel FET with dynamic threshold operation architecture[A].,2013:1. |
[25] | Vandooren A;Leonelli D;Rooyackers R.Trap-assisted tunneling in vertical Si and SiGe hetero-tunnel-FETs[A].,2012:1. |
[26] | SILVACO.ATLAS User's Manual[M].,2011 |
[27] | Schenk A.A model for the field and temperature dependence of Shockley-Read-Hall lifetimes in silicon[J].Solid-State Electronics,199235:1585. |
[28] | Crowell C R;Rideout V L.Normalized thermionic-field (TF) emission in metal-semiconductor (Schottky) barriers[J].Solid-State Electronics,196912:89. |
[29] | Murphy E L;Good R H.Thermionic emission,field emission,and the transition region[J].Physical Review,1956102:1464. |
[30] | Crowell C R;Sze S M.Current transport in metal-semiconductor barriers[J].Solid-State Electronics,19669:1035. |
[31] | Mookerjea S;Krishnan R;Datta S.Effective capacitance and drive current for tunnel FET (TFET) CV/I estimation[J].IEEE Transactions on Electron Devices,200956:2092. |
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