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ITO/Ga2O3 bi-layer films were deposited on quartz glass substrates by magnetron sputtering.The effect of substrate temperature on the structure,surtace morphology,optical and electrical properties of ITO/Ga2O3 films was investigated by an X-ray diffractometer,a scanning electron microscope,a double beam spectrophotometer and the Hall system,respectively.The structural characteristics showed a dependence on substrate temperature.The resistivity of the films varied from 6.71 × 10-3 to 1.91 × 10-3 Ω·cm as the substrate temperature increased from 100 to 350 ℃.ITO (22 nm)/Ga2O3 (50 nm) films deposited at 300 ℃ exhibited a low sheet resistance of 373.3 Ω/□ and high deep ultraviolet transmittance of 78.97% at the wavelength of 300 nm.

参考文献

[1] Al-Kuhaili M F,Durrani S M A,Khawaja E E.Optical properties of gallium oxide films deposited by electron-beam evaporation.Appl Phys Lett,2003,83(22):4533
[2] Kim H W,Kim N H.Growth of gallium oxide thin films on silicon by the metal organic chemical vapor deposition method.Mater Sci Eng B,2004,110(1):34
[3] Ueda N,Hosono H,Waseda R,et al.Synthesis and control of conductivity of ultraviolet transmitting β-Ga2O3 single crystals.Appl Phys Lett,1997,70(26):3561
[4] Orita M,Hiramatsu H,Hosono H,et al.Deep-ultraviolet transparent conductive β-Ga2O3 thin films.Appl Phys Lett,2000,77(25):4166
[5] Orita M,Hiramatsu H,Ohta H,et al.Preparation of highly conductive,deep ultraviolet transparent β-Ga2O3 thin film at low deposition temperatures.Thin Solid Films,2002,411 (1):134
[6] Powder Diffraction File.Joint Committee on Powder Diffraction Standards.ASTM,Philadelphia,PA,1967,Card 6-0416
[7] Meng L J,Dos S M P.Properties of indium tin oxide films prepared by RF reactive magnetron sputtering at different substrate temperature.Thin Solid Films,1998,322(1/2):56
[8] Itoyama,Kuniyoshi.Properties of Sn-doped indium oxide prepared by high rate and low temperature RF sputtering.Jpn J Appl phys,1978,17(7):1191
[9] Guillen C,Herrero J.Influence of oxygen in the deposition and annealing atmosphere on the characteristics of ITO thin films prepared by sputtering at room temperature.Vacuum,2006,80(6):615
[10] Tauc J.Amorphous and liquid semiconductors.London Plenum,1974
[11] Patel N G,Lashkari B H.Conducting transparent indium-tin oxide films by post deposition annealing in different humidity environments.J Mater Sci,1992,27(11):3026
[12] Sernelius B E,Berggren K F,Jin Z C,et al.Band-gap tailoring of ZnO by means of heavy Al doping.Phys Rev B,1988,37(17):10244
[13] Ellmer K,Mientus R.Carrier transport in polycrystalline transparent conductive oxides:a comparative study of zinc oxide and indium oxide.Thin Solid Films,2008,516(14):4620
[14] Ellmer K,Mientus R.Carrier transport in polycrystalline ITO and ZnO:Al Ⅱ:the influence of grain barriers and boundaries.Thin Solid Films,2008,516(17):5829
[15] Kim S,Lee W I,Lee E H,et al.Dependence of the resistivity and the transmittance of sputter-deposited Ga-doped ZnO films on oxygen partial pressure and sputtering temperature.J Mater Sci,2007,42(13):4845
[16] Wu W F,Chiou B S.Effect of annealing on electrical and optical properties of RF magnetron sputtered indium tin oxide films.Appl Surf Sci,1993,68(4):497
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