Application of stratified implantation for silicon micro-strip detectors

1.Institute of Modern Physics, Chinese Academy of Sciences, Lanzhou 730000, China

2.Institute of Modern Physics, Chinese Academy of Sciences, Lanzhou 730000, China

3.Institute of Microelectronics, School of Physical Science and Technology, Lanzhou University, Lanzhou 730000, China

4.Institute of Modern Physics, Chinese Academy of Sciences, Lanzhou 730000, China

5.Institute of Modern Physics, Chinese Academy of Sciences, Lanzhou 730000, China

6.Institute of Modern Physics, Chinese Academy of Sciences, Lanzhou 730000, China

7.Institute of Modern Physics, Chinese Academy of Sciences, Lanzhou 730000, China

基金项目: Supported by National Natural Science Foundation of China (11175223,11305231,11205220)

[1]	LI Hai-Xia,LI Zhan-Kui,WANG Fang-Cong,WANG Zhu-Sheng,WANG Xiu-Hua,LI Chun-Yan.Preparation of a silicon micro-strip nuclear radiation detector by a two-step annealing process[J].中国物理C（英文版）,2011(07):635-637.

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