采用简便的“先核后壳”和“先壳后核”途径制备了M@SiO2 (M=Ag,Au,Pt)核壳结构.采用“先核后壳”途径时,金属内核可以控制在6-9 nm,粒径分布均匀,SiO2壳层织构可调.该途径制备过程简便,无需高速离心分离,可有效节约制备成本.由该途径制得的Au@mSiO2中纳米Au的热稳定性高,经550℃空气焙烧后仍能保持高的CO氧化性能(T100=235℃).由“先壳后核”途径制得的核壳结构内核金属粒子也可以控制在< 10nm,粒径分布均匀,且SiO2壳层孔隙率可以预调,即使在液相中也可有效消除对硝基苯酚反应物分子的扩散限制,并于室温下将其还原为对氨基苯酚.两种途径所得的核壳结构均呈高单分散态.使用含有不同有机官能团的硅源可对介孔SiO2壳层进行进一步改性,拓展应用领域,因而具有很好的潜在应用前景.
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