在303,514和543K下用0.8％H2O-99.2％H2对Ni2P/SiO2催化剂进行了水蒸气处理,利用N2吸附-脱附、X射线衍射、电感耦合等离子体发射光谱、H2程序升温脱附及原位漫反射红外光谱等技术对水蒸气处理前后Ni2P/SiO2催化剂的结构进行了表征,并在常压固定床反应器上评价了其催化氯苯加氢脱氯活性.结果表明,经水蒸气处理后,Ni2P/SiO2催化剂的物相及元素组成、Ni2P晶粒大小、比表面积及孔结构没有明显改变.与未处理和303K处理的Ni2P/SiO2催化剂不同,513和543K处理的催化剂表面暴露的Ni中心数量减少,表面P-OH基团数量增多.在513K,氯苯空速3.75ml/(g·h)及H2和氯苯的摩尔比为9.0的反应条件下,经不同温度水蒸气处理的Ni2P/SiO2催化剂上氯苯初始转化率高于93.8％,约是未预处理催化剂的17倍.这可能与金属Ni中心和表面P-OH基团的协同作用有关.
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