采用程序升温表面反应(TPSR)和原位漫反射红外光谱(DRIFTS)等手段研究了常温下NO和O2在高硅Na-ZSM-5分子筛上吸附-氧化反应机理.结果表明,Na-ZSM-5分子筛上NO的催化氧化过程中伴随着显著的NO2物理吸附,表现为NO氧化和N02吸附间的动态平衡.Na-ZSM-5分子筛表面NOx吸附物种的TPSR和原位DRIFTS表征表明,化学吸附的NO和气相中的O2在Na-ZSM-5表面反应生成吸附态的NO3,并继续与NO作用生成弱吸附的NO2和N2O4,它们吸附饱和后释放出来;其中,强吸附的NO3在NO氧化过程中起到了反应中间体的作用,同时也促进了NO的吸附.
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