欢迎登录材料期刊网

材料期刊网

中国科学院金属研究所 科学出版社
高级检索
  1. 首页
  2. 期刊
  3. 稀有金属
  4. Microstructure and corrosion resistance of vanadium films deposited at different target-substrate distance by HPPMS

稀有金属, 2014, 33(5): 587-593. doi: 10.1007/s12598-014-0282-7

Chun-Wei Li 1, , Xiu-Bo Tian 2, , Tian-Wei Liu 3, , Jian-Wei Qin 4, , Chun-Zhi Gong 5,

1.College of Engineering and Technology, Northeast Forestry University, Harbin 150040, China

2.State Key Laboratory of Advanced Welding and Joining, Harbin Institute of Technology, Harbin 150001, China

3.State Key Laboratory of Surface Physics and Chemistry, China Academy of Engineering Physics, Mianyang 621900, China

4.State Key Laboratory of Surface Physics and Chemistry, China Academy of Engineering Physics, Mianyang 621900, China

5.State Key Laboratory of Advanced Welding and Joining, Harbin Institute of Technology, Harbin 150001, China

基金项目:   This study was financially supported by the National Natural Science Foundation of China (Nos.51175118 and U1330110) and the Open Foundation of Science and Technology on Surface Physics and Chemistry Laboratory (No.SPC201104).  

Microstructure and corrosion resistance of vanadium films deposited at different target-substrate distance by HPPMS

Keywords： High power pulsed magnetron sputtering

参考文献

[1] 代国琴,曲文卿,庄鸿寿.铝合金热管低温扩散钎焊接头组织性能与扩散机制研究[J].稀有金属,2013(06):851-856.
[2] Ming-Chao Yu,Wei Liang.Preparation and corrosion resistance of the micro-arc oxidation coating on Al2O3f/ZL109 composites[J].稀有金属（英文版）,2013(03):290-293.
[3] Zhongzhen Wu;Xiubo Tian;Zeming Wang;Chunzhi Gong;Shiqin Yang;Cher Ming Tan;PaulK.Chu .Microstructure and mechanical properties of CrN films fabricated by high power pulsed magnetron discharge plasma immersion ion implantation and deposition[J].Applied Surface Science: A Journal Devoted to the Properties of Interfaces in Relation to the Synthesis and Behaviour of Materials,2011(1):242-246.
[4] Emmerlich J;Mraz S;Snyders R;Jiang K;Schneider JM .The physical reason for the apparently low deposition rate during high-power pulsed magnetron sputtering[J].Vacuum: Technology Applications & Ion Physics: The International Journal & Abstracting Service for Vacuum Science & Technology,2008(8):867-870.
[5] Shicai Yang;Xiaoying Li;K.E. Cooke;D.G. Teer .A study of TiMoN nano-multilayer coatings deposited by CFUBMSIP using DC and HIPIMS power[J].Applied Surface Science: A Journal Devoted to the Properties of Interfaces in Relation to the Synthesis and Behaviour of Materials,2012(6):2062-2067.
[6] Bobzin, K.;Bagcivan, N.;Ewering, M.;Brugnara, R.H.;Thei?, S. .DC-MSIP/HPPMS (Cr,Al,V)N and (Cr,Al,W)N thin films for high-temperature friction reduction[J].Surface & Coatings Technology,2011(8/9):2887-2892.
[7] Purandare, YP;Ehiasarian, AP;Stack, MM;Hovsepian, PE .CrN/NbN coatings deposited by HIPIMS: A preliminary study of erosion-corrosion performance[J].Surface & Coatings Technology,2010(8):1158-1162.
[8] R. Wuhrer;W. Y. Yeung .Effect of target-substrate working distance on magnetron sputter deposition of nanostructured titanium aluminium nitride coatings[J].Scripta materialia,2003(3):199-205.
[9] G. F. Iriarte;J. G. Rodriguez;F. Calle .Effect of substrate-target distance and sputtering pressure in the synthesis of AlN thin films[J].Microsystem technologies,2011(3):381-386.
[10] J.S. Lamas;W.P. Leroy;D. Depla .Influence of target-substrate distance and composition on the preferential orientation of yttria-stabilized zirconia thin films[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,2012(14):4782-4785.
[11] Jyh Gwo;Chun-Lin Chu;Ming-Jui Tsai;Shyong Lee .Enhancement of Ti-containing hydrogenated carbon (Ti-C:H) films by high-power plasma-sputtering[J].Applied Surface Science: A Journal Devoted to the Properties of Interfaces in Relation to the Synthesis and Behaviour of Materials,2012(8):3433-3437.
[12] 桂刚,田修波,朱宗涛,吴忠振,巩春志,杨士勤.1kA高功率脉冲磁控溅射电源研制及试验研究[J].真空,2011(04):46-50.
[13] Chen ZX;Lu BZ;Huang QP;Wang LS;Huang BY .Sputtering-growth of Cu/Zn alloy nanofilms on acrylics substrate[J].Materials Science & Engineering, B. Solid-State Materials for Advanced Technology,2005(1):81-86.
[14] X. H. Li;Z. Yang .Effects of sputtering conditions on the structure and magnetic properties of Ni-Fe films[J].Materials Science & Engineering, B. Solid-State Materials for Advanced Technology,2004(1):41-45.
[15] Liang Shuang,Mei Zeng-Xia,Du Xiao-Long.Modulation of electrical and optical properties of gallium-doped ZnO films by radio frequency magnetron sputtering[J].中国物理B（英文版）,2012(06):478-484.
[16] ZHANG Jin,YANG Dong-hua,OU Xin-bing.Microstructures and properties of aluminum film and its effect on corrosion resistance of AZ31B substrate[J].中国有色金属学会会刊(英文版),2008(z1):312-317.
[17] 崔学军,刘春海,杨瑞嵩,李明田,林修洲,龚敏.镁合金AZ31无铬无氟无亚硝酸盐磷化膜的制备及耐蚀性能[J].中国有色金属学报（英文版）,2012(11):2713-2718.
[18] Zou, Y.S.;Zhou, K.;Wu, Y.F.;Yang, H.;Cang, K.;Song, G.H. .Structure, mechanical and tribological properties of diamond-like carbon films on aluminum alloy by arc ion plating[J].Vacuum: Technology Applications & Ion Physics: The International Journal & Abstracting Service for Vacuum Science & Technology,2012(8):1141-1146.
[19] Chiang, K.T.K.;Wei, R. .Growth morphology and corrosion resistance of magnetron sputtered Cr films[J].Surface & Coatings Technology,2011(7):1660-1665.
[20] 王艳秋,王岳,陈派明,邵亚薇,王福会.7075铝合金微弧氧化涂层的组织结构与耐蚀耐磨性能[J].金属学报,2011(04):455-461.
上一张 下一张
上一张 下一张
计量
  • 下载量()
  • 访问量()
作者相关
文章评分
  • 您的评分：
  • 1
    0%
  • 2
    0%
  • 3
    0%
  • 4
    0%
  • 5
    0%

版权所有©2010中国科学院金属研究所中国科技出版传媒股份有限公司

本系统由北京仁和汇智信息技术有限公司设计开发

技术支持：info@rhhz.net