材料工程, 2017, 45(2): 102-111.
10.11868/j.issn.1001-4381.2015.001179
SiC发光特性及其调控研究进展

王思聪 1, , 季凌飞 2, , 吴燕 3, , 张永哲 4, , 闫胤洲 5,

1.北京工业大学激光工程研究院 ,北京,100124;
2.北京工业大学激光工程研究院 ,北京,100124;
3.北京工业大学激光工程研究院 ,北京,100124;
4.北京工业大学材料科学与工程学院 ,北京,100124;
5.北京工业大学激光工程研究院 ,北京,100124

碳化硅(SiC)作为第三代半导体的代表材料,具有禁带宽度大、热导率高和临界击穿电场高等特点,所制备的光电器件在高温、强辐射等极端、恶劣条件下有巨大的应用潜力.本文综述了国内外SiC发光性质的研究现状,介绍SiC发光的实际应用,阐述了单晶、纳米晶和薄膜不同形态SiC的制备方法及发光特点,并对SiC发光调控的研究进展进行了探讨与展望.利用新兴技术手段,可实现对SiC发光光谱和发光效率等性质的调控.
引用: 王思聪, 季凌飞, 吴燕, 张永哲, 闫胤洲 SiC发光特性及其调控研究进展. 材料工程, 2017, 45(2): 102-111. doi: 10.11868/j.issn.1001-4381.2015.001179
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