{"currentpage":1,"firstResult":0,"maxresult":10,"pagecode":5,"pageindex":{"endPagecode":5,"startPagecode":1},"records":[{"abstractinfo":"单相CrN薄膜较难制取,国外已形成商用,而国内相关研究尚处于起步阶段.采用多弧离子镀技术在45钢表面沉积CrN薄膜,通过扫描电镜观察了CrN薄膜的表面形貌,采用X射线衍射仪对其相结构进行了分析,分别讨论了CrN薄膜在3.5％ NaCl溶液、1 mol/L NaOH溶液和1 mol/L H2SO4溶液中的电化学腐蚀性能,在其他制备参数不变的条件下,考察了<span style=\"color:red\">氩</span><span style=\"color:red\">氮</span><span style=\"color:red\">流量</span>比对薄膜组织结构以及性能的影响.结果表明:随着<span style=\"color:red\">氩</span><span style=\"color:red\">氮</span><span style=\"color:red\">流量</span><span style=\"color:red\">比</span>的减小,CrN薄膜表面的液滴尺寸和数目逐渐减小;薄膜主要以CrN相为主,随着<span style=\"color:red\">氩</span><span style=\"color:red\">氮</span><span style=\"color:red\">流量</span><span style=\"color:red\">比</span>的增大,CrN(110)的峰值逐渐减弱,CrN(200)的峰值逐渐增强;随着<span style=\"color:red\">氩</span><span style=\"color:red\">氮</span><span style=\"color:red\">流量</span><span style=\"color:red\">比</span>的减小,CrN薄膜在3.5％NaCl溶液、1 mol/L NaOH溶液和1mol/L H2SO4溶液中的耐蚀性均得到提高,在<span style=\"color:red\">氩</span><span style=\"color:red\">氮</span><span style=\"color:red\">流量</span><span style=\"color:red\">比</span>1:3时,薄膜的耐腐蚀性最佳.","authors":[{"authorName":"张焱","id":"5b64be86-3fa8-4adb-b4b0-313b2b7a50aa","originalAuthorName":"张焱"},{"authorName":"高原","id":"60a56f68-98bf-4607-8ed5-1bc295d60961","originalAuthorName":"高原"},{"authorName":"吴炜钦","id":"279b54d8-833e-4d41-b1d0-3b4c6be6131e","originalAuthorName":"吴炜钦"}],"doi":"","fpage":"8","id":"0fb18c2d-ed49-4bd2-b699-79f83800f6f9","issue":"5","journal":{"abbrevTitle":"CLBH","coverImgSrc":"journal/img/cover/CLBH.jpg","id":"7","issnPpub":"1001-1560","publisherId":"CLBH","title":"材料保护"},"keywords":[{"id":"90a70127-070c-41d3-adce-0e458df58cf7","keyword":"多弧离子镀","originalKeyword":"多弧离子镀"},{"id":"33fb8b68-e7c0-4d96-910f-8244e05fa773","keyword":"CrN薄膜","originalKeyword":"CrN薄膜"},{"id":"c3e44674-5331-496d-a611-6eeaac2f98a7","keyword":"耐蚀性","originalKeyword":"耐蚀性"},{"id":"ae6eb2c7-8ddc-47be-95cd-5f040ed42b8e","keyword":"<span style=\"color:red\">氩</span><span style=\"color:red\">氮</span><span style=\"color:red\">流量</span><span style=\"color:red\">比</span>","originalKeyword":"氩氮流量比"},{"id":"b092ebf4-a881-4b9a-9441-fde54941c55f","keyword":"45钢","originalKeyword":"45钢"}],"language":"zh","publisherId":"clbh201405003","title":"多弧离子镀CrN薄膜的耐腐蚀性能","volume":"47","year":"2014"},{"abstractinfo":"采用直流磁控溅射镀膜工艺,在不同的<span style=\"color:red\">氮</span><span style=\"color:red\">氩</span><span style=\"color:red\">流量</span><span style=\"color:red\">比</span>条件下,制备了玻璃基TiN薄膜.通过X射线衍射仪(XRD)、场发射扫描电子显微镜(SEM、EDS)、纳米显微硬度仪,研究了TiN薄膜的组织结构、物相组成、表面形貌、元素成份、维氏硬度,分析了<span style=\"color:red\">氮</span><span style=\"color:red\">氩</span><span style=\"color:red\">流量</span>比对TiN薄膜结晶取向、硬度的影响机理.结果表明,在低的<span style=\"color:red\">氮</span><span style=\"color:red\">氩</span><span style=\"color:red\">流量</span><span style=\"color:red\">比</span>条件下,TiN薄膜以(111)晶面择优取向;随着<span style=\"color:red\">氮</span><span style=\"color:red\">氩</span><span style=\"color:red\">流量</span>比增加,择优取向由(111)晶面向(200)晶面过渡;<span style=\"color:red\">氮</span><span style=\"color:red\">氩</span><span style=\"color:red\">流量</span>比为1∶2时薄膜以(200)晶面择优取向;继续增加<span style=\"color:red\">氮</span><span style=\"color:red\">氩</span><span style=\"color:red\">流量</span><span style=\"color:red\">比</span>(1∶2 ～2∶1),TiN薄膜衍射峰强度降低,晶粒尺寸减小;当<span style=\"color:red\">氮</span><span style=\"color:red\">氩</span><span style=\"color:red\">流量</span>比增加到2∶1时,薄膜开始呈现非晶态.随着<span style=\"color:red\">氮</span><span style=\"color:red\">氩</span><span style=\"color:red\">流量</span><span style=\"color:red\">比</span>的增加,薄膜硬度呈现先增加后减小的趋势;当<span style=\"color:red\">氮</span><span style=\"color:red\">氩</span><span style=\"color:red\">流量</span>比为1∶1时,TiN薄膜以(200)晶面择优取向结晶,组织致密均匀,晶粒尺寸最小,具有最大的硬度值(825 HV),相比未镀膜的玻璃基片,硬度值增加了20.44％.","authors":[{"authorName":"顾宝宝","id":"d8ef8e4b-3ea6-4197-8e84-a0c1a05ed4ea","originalAuthorName":"顾宝宝"},{"authorName":"赵青南","id":"e83a59eb-9055-49e8-98f5-e18ff044bb5f","originalAuthorName":"赵青南"},{"authorName":"刘旭","id":"88a31e49-d5d2-4a81-a4d7-e410d3353940","originalAuthorName":"刘旭"},{"authorName":"罗乐平","id":"28f4b143-eaad-47d6-925d-e2c4122db719","originalAuthorName":"罗乐平"},{"authorName":"丛芳玲","id":"71a13e7b-e259-4b0e-b1ad-550c78ecaeca","originalAuthorName":"丛芳玲"},{"authorName":"赵修建","id":"1d0b36cd-a1b2-44fe-8c66-f6fdc4700929","originalAuthorName":"赵修建"}],"doi":"","fpage":"4076","id":"a22d9a5a-7eff-4993-a1ed-5a524b65b322","issue":"12","journal":{"abbrevTitle":"GSYTB","coverImgSrc":"journal/img/cover/GSYTB.jpg","id":"36","issnPpub":"1001-1625","publisherId":"GSYTB","title":"硅酸盐通报   "},"keywords":[{"id":"76b46b71-76ca-4906-b9e3-fab8dd2de955","keyword":"磁控溅射","originalKeyword":"磁控溅射"},{"id":"39dd327a-dea3-4032-a041-391abc30e8f7","keyword":"玻璃基TiN薄膜","originalKeyword":"玻璃基TiN薄膜"},{"id":"f0687c0a-f7df-47c0-83e5-2e48e778fc0b","keyword":"硬度","originalKeyword":"硬度"},{"id":"6fdcc9c3-33d9-4e1e-b186-56c58e732832","keyword":"<span style=\"color:red\">氮</span><span style=\"color:red\">氩</span><span style=\"color:red\">流量</span><span style=\"color:red\">比</span>","originalKeyword":"氮氩流量比"}],"language":"zh","publisherId":"gsytb201612029","title":"<span style=\"color:red\">氮</span><span style=\"color:red\">氩</span><span style=\"color:red\">流量</span>比对玻璃基TiN薄膜的结构和硬度的影响","volume":"35","year":"2016"},{"abstractinfo":"采用直流反应磁控溅射法,通过控制<span style=\"color:red\">氮</span><span style=\"color:red\">氩</span><span style=\"color:red\">流量</span><span style=\"color:red\">比</span>,在Si(111)衬底上沉积了TiN薄膜,并用织构系数来量化TiN薄膜的生长取向.对TiN薄膜的织构、物相组成、形貌进行表征,分析了溅射沉积过程中<span style=\"color:red\">氮</span><span style=\"color:red\">氩</span><span style=\"color:red\">流量</span>比对TiN薄膜生长织构的影响,同时还分析了不同织构薄膜的表面及截面形貌.结果表明:<span style=\"color:red\">氮</span><span style=\"color:red\">氩</span><span style=\"color:red\">流量</span><span style=\"color:red\">比</span>低于1:30时,薄膜的织构由(200)转变为(111),同时还出现了TiN061相；(111)织构的薄膜表面均匀,致密性好,粗糙度小,以<span style=\"color:red\">氮</span><span style=\"color:red\">氩</span><span style=\"color:red\">流量</span>比为1:60时所得织构系数为1.63的(111)薄膜最好.","authors":[{"authorName":"田颖萍","id":"66b4d941-bc8e-4dc6-be37-419697bd79d0","originalAuthorName":"田颖萍"},{"authorName":"范洪远","id":"96c6891c-0f56-4936-80ec-3c9b613dacbb","originalAuthorName":"范洪远"},{"authorName":"成靖文","id":"9bf070d9-00a0-4939-acd0-8c7506228c4f","originalAuthorName":"成靖文"}],"doi":"10.3969/j.issn.1001-3660.2012.03.006","fpage":"19","id":"0d787f69-d1de-41aa-b6d6-b8773b46490e","issue":"3","journal":{"abbrevTitle":"BMJS","coverImgSrc":"journal/img/cover/BMJS.jpg","id":"3","issnPpub":"1001-3660","publisherId":"BMJS","title":"表面技术   "},"keywords":[{"id":"e96626e3-8396-4df2-81db-641aae69fa6e","keyword":"<span style=\"color:red\">氮</span>氩气压<span style=\"color:red\">比</span>","originalKeyword":"氮氩气压比"},{"id":"9f4a4e19-0f3b-481d-ac61-5585995ef9fb","keyword":"氮化钛薄膜","originalKeyword":"氮化钛薄膜"},{"id":"c6a1db10-7a94-48de-bb2d-74759be491ee","keyword":"织构","originalKeyword":"织构"},{"id":"638e9733-326b-4026-82bd-bee74b5233ad","keyword":"磁控溅射","originalKeyword":"磁控溅射"}],"language":"zh","publisherId":"bmjs201203006","title":"<span style=\"color:red\">氮</span><span style=\"color:red\">氩</span><span style=\"color:red\">流量</span>比对磁控溅射TiN薄膜生长织构的影响","volume":"41","year":"2012"},{"abstractinfo":"超大规模集成电路Cu互连中的核心技术之一是制备性能优异的扩散阻挡层.本文采用直流磁控反应溅射在N2/Ar气氛中制备了不同组分<span style=\"color:red\">比</span>的Ta-N薄膜,并原位制备了Cu/Ta-N/基底复合结构,对部分样品在N2保护下进行了快速热处理(RTA),采用台阶仪、四探针测试仪、原子力显微镜(AFM)、扫描电镜、X射线衍射(XRD)对薄膜形貌结构进行了表征.结果表明,随着N2<span style=\"color:red\">流量</span><span style=\"color:red\">比</span>的增加,薄膜沉积速率下降,表面趋于平滑,Ta-N薄膜热稳定性能及阻挡性能随之提高,而电阻率则上升.<span style=\"color:red\">氮</span><span style=\"color:red\">流量</span>比为0.3制备的厚度为100nm的Ta-N薄膜经600℃/5min RTA后,仍可保持对Cu的有效阻挡;在更高温度下退火,Cu将穿过阻挡层与Si发生反应,导致阻挡层失效.","authors":[{"authorName":"李幼真","id":"15c692af-fbd4-413d-ba53-d054fe9c0393","originalAuthorName":"李幼真"},{"authorName":"周继承","id":"0b8c1fa8-e0d7-4247-8648-92af00e7085a","originalAuthorName":"周继承"},{"authorName":"陈海波","id":"bb10b907-5198-46d0-a93e-ca02da6b2ffa","originalAuthorName":"陈海波"},{"authorName":"黄迪辉","id":"41bec0fa-1e0d-4888-86a4-7d98a324a110","originalAuthorName":"黄迪辉"},{"authorName":"刘正","id":"440fe8a1-a9ce-49bf-a969-e615c0e46f44","originalAuthorName":"刘正"}],"doi":"10.3969/j.issn.1007-4252.2008.04.007","fpage":"769","id":"95c85126-0479-474a-b10c-80f2a69e7ab0","issue":"4","journal":{"abbrevTitle":"GNCLYQJXB","coverImgSrc":"journal/img/cover/GNCLYQJXB.jpg","id":"34","issnPpub":"1007-4252","publisherId":"GNCLYQJXB","title":"功能材料与器件学报   "},"keywords":[{"id":"cc422610-4c6f-4704-a82b-8b01f73b9d84","keyword":"Cu互连","originalKeyword":"Cu互连"},{"id":"02ab4638-a6a2-49fc-8dd3-6dfe97b6448d","keyword":"Ta-N阻挡层","originalKeyword":"Ta-N阻挡层"},{"id":"3983f027-4336-45e4-ad52-0f245dc4094e","keyword":"<span style=\"color:red\">氮</span>分压","originalKeyword":"氮分压"},{"id":"25702c7d-9c03-47c0-a2ab-d600cfcc0792","keyword":"失效机制","originalKeyword":"失效机制"}],"language":"zh","publisherId":"gnclyqjxb200804007","title":"不同<span style=\"color:red\">氮</span><span style=\"color:red\">流量</span><span style=\"color:red\">比</span>制备纳米Ta-N薄膜及其性能","volume":"14","year":"2008"},{"abstractinfo":"对Gaye真空吹<span style=\"color:red\">氩</span>脱<span style=\"color:red\">氮</span>模型进行了修正,并利用修正后的模型研究了真空度、吹<span style=\"color:red\">氩</span>量以及氧、硫含量等因素对VD真空吹<span style=\"color:red\">氩</span>脱<span style=\"color:red\">氮</span>效果的影响.结果表明,模型计算值与实测值符合较好,证明修正后的模型能够较好地模拟VD真空吹<span style=\"color:red\">氩</span>脱<span style=\"color:red\">氮</span>过程.","authors":[{"authorName":"周世祥","id":"7437f8d6-65f6-4b2f-892b-db33a3db8714","originalAuthorName":"周世祥"},{"authorName":"迪林","id":"eb6d101c-0e8e-40cf-8bc4-426ccbaa6a29","originalAuthorName":"迪林"},{"authorName":"傅杰","id":"f115be95-2129-4b69-8f30-3cbed5900a25","originalAuthorName":"傅杰"},{"authorName":"王平","id":"ca9c5e2a-86aa-442b-a62d-c9a8ed1394b2","originalAuthorName":"王平"}],"doi":"","fpage":"5","id":"c09bdff8-0499-4a0d-b6be-2651f19f1fcb","issue":"6","journal":{"abbrevTitle":"GTYJXB","coverImgSrc":"journal/img/cover/GTYJXB.jpg","id":"30","issnPpub":"1001-0963","publisherId":"GTYJXB","title":"钢铁研究学报"},"keywords":[{"id":"bfb8d16b-11fb-409d-b758-20f47005c47c","keyword":"VD","originalKeyword":"VD"},{"id":"0455379a-2453-4581-9766-c806ca960bb4","keyword":"脱<span style=\"color:red\">氮</span>","originalKeyword":"脱氮"},{"id":"979e3d81-519b-4874-8953-7280083f7e82","keyword":"动力学","originalKeyword":"动力学"},{"id":"13a72296-f82e-441e-8e38-8746b453d454","keyword":"模型","originalKeyword":"模型"}],"language":"zh","publisherId":"gtyjxb200106002","title":"VD 真空吹<span style=\"color:red\">氩</span>脱<span style=\"color:red\">氮</span>模型","volume":"13","year":"2001"},{"abstractinfo":"运用射频磁控溅射技术,改变<span style=\"color:red\">氩</span>、<span style=\"color:red\">氮</span><span style=\"color:red\">流量</span><span style=\"color:red\">比</span>(9/1 ～ 9/4)在玻璃衬底上获得ZnO∶N样品,采用XRD、紫外-可见分光光度计、傅里叶红外光谱仪及SEM对薄膜微结构和光学性能表征.结果发现∶N<span style=\"color:red\">流量</span>小,样品XRD峰强小,峰位不明显,紫外可见光光谱在320 ～780 nm波长区间透射率变化小；随着N<span style=\"color:red\">流量</span>的增加,样品XRD有(002)强单峰出现,在400 nm波长以下透射率急剧下降；当<span style=\"color:red\">氩</span><span style=\"color:red\">氮</span><span style=\"color:red\">流量</span>达到9/4,样品XRD出现双峰,紫外光透射率无明显变化.","authors":[{"authorName":"朱华","id":"08b9ccea-8722-4153-8615-99b894a871b2","originalAuthorName":"朱华"},{"authorName":"况慧芸","id":"ad827ab4-406a-4183-9344-aeef32f53196","originalAuthorName":"况慧芸"},{"authorName":"冯晓炜","id":"a4533d82-f20f-491f-9430-ce83a6fbb188","originalAuthorName":"冯晓炜"},{"authorName":"万文琼","id":"191088e2-c361-4c34-ad14-599108995038","originalAuthorName":"万文琼"}],"doi":"","fpage":"1280","id":"ebb2bdbd-8ed9-4902-b973-df2f216b4151","issue":"5","journal":{"abbrevTitle":"RGJTXB","coverImgSrc":"journal/img/cover/RGJTXB.jpg","id":"57","issnPpub":"1000-985X","publisherId":"RGJTXB","title":"人工晶体学报"},"keywords":[{"id":"c200567b-e493-4153-a6c5-8523ae02e05c","keyword":"ZnO∶N薄膜","originalKeyword":"ZnO∶N薄膜"},{"id":"27ce9a03-e348-40ac-80d8-835d6be4d8f4","keyword":"透射率","originalKeyword":"透射率"},{"id":"34cfd433-ec0e-426b-b9c3-1073ec90e8cc","keyword":"磁控溅射","originalKeyword":"磁控溅射"}],"language":"zh","publisherId":"rgjtxb98201205025","title":"<span style=\"color:red\">氮</span><span style=\"color:red\">流量</span>对ZnO∶N薄膜微结构及光学性能影响","volume":"41","year":"2012"},{"abstractinfo":"运用射频磁控溅射技术,改变<span style=\"color:red\">氩</span>氧<span style=\"color:red\">流量</span><span style=\"color:red\">比</span>在玻璃衬底上生长ZnO∶ Al(ZAO)样品,采用XRD、紫外-可见分光光度计对薄膜微结构、厚度及其光学性能表征,结果发现:维持<span style=\"color:red\">氩</span><span style=\"color:red\">流量</span>不变(9 sccm),随着氧<span style=\"color:red\">流量</span>增加(1～9 sccm),样品XRD峰强减小,半高宽增大,晶粒尺寸减小,薄膜结晶性能变差;而维持氧<span style=\"color:red\">流量</span>不变(9 sccm),<span style=\"color:red\">氩</span><span style=\"color:red\">流量</span>减小(9～3 sccm),样品XRD峰强增大,半高宽减小,晶粒尺寸变大,结晶性能变好.紫外可见光光谱在400 ～ 900nm波长区间平均透射率差异大(67.9％ ～91.1％);在420 ～ 900 nm波长区间平均透光率高且差异小(90.2％ ～92.4％).","authors":[{"authorName":"朱华","id":"3262ea35-95d9-4924-b599-11b424a4d024","originalAuthorName":"朱华"},{"authorName":"万文琼","id":"327b6ef6-927b-48c3-a89a-ef2d8b11ae9c","originalAuthorName":"万文琼"},{"authorName":"况慧芸","id":"89870aea-dad3-4639-8525-d0fdac641529","originalAuthorName":"况慧芸"},{"authorName":"冯晓炜","id":"e49f1fa6-d9bd-4f74-ac08-3b6dbaff1004","originalAuthorName":"冯晓炜"}],"doi":"","fpage":"1808","id":"ff22c218-6ec8-4b72-a506-f38a14b74bff","issue":"9","journal":{"abbrevTitle":"RGJTXB","coverImgSrc":"journal/img/cover/RGJTXB.jpg","id":"57","issnPpub":"1000-985X","publisherId":"RGJTXB","title":"人工晶体学报"},"keywords":[{"id":"385ceba9-e3ee-4cda-805f-22b53d64f348","keyword":"ZnO∶Al薄膜","originalKeyword":"ZnO∶Al薄膜"},{"id":"5ea5baf2-0627-4f1a-b90d-8a83579a9e40","keyword":"透射率","originalKeyword":"透射率"},{"id":"4435a4f3-c173-4f9b-aeef-185f676b0660","keyword":"磁控溅射","originalKeyword":"磁控溅射"}],"language":"zh","publisherId":"rgjtxb98201309016","title":"<span style=\"color:red\">氩</span>氧<span style=\"color:red\">流量</span>对ZAO薄膜微结构及其光学性能影响","volume":"42","year":"2013"},{"abstractinfo":"在氧化钒薄膜的直流磁控溅射制备中,<span style=\"color:red\">氩</span><span style=\"color:red\">流量</span>是影响沉膜工艺以及薄膜织构和性能的重要因素之一.从氧化钒薄膜制备角度出发,研究了纯<span style=\"color:red\">氩</span>环境以及氧<span style=\"color:red\">流量</span>恒定的<span style=\"color:red\">氩</span>氧混合环境中溅射电压和薄膜沉积速率随<span style=\"color:red\">氩</span><span style=\"color:red\">流量</span>的变化.实验结果有助于对氧化钒薄膜制备工艺进行优化,为氩气<span style=\"color:red\">流量</span>的选择提供参考.","authors":[{"authorName":"魏雄邦","id":"d3200486-1c3d-4102-82b1-55bc6b19e724","originalAuthorName":"魏雄邦"},{"authorName":"王涛","id":"3b861c8f-9311-41cb-8659-51a70646cca9","originalAuthorName":"王涛"},{"authorName":"吴志明","id":"2b170f9b-65de-4a70-adce-48f56c1087b5","originalAuthorName":"吴志明"},{"authorName":"蒋亚东","id":"ce5b99a4-d7bb-4e8c-b755-4d6624d12195","originalAuthorName":"蒋亚东"}],"doi":"","fpage":"176","id":"358332cf-63d1-4801-9c04-ecaa2a5f9562","issue":"z2","journal":{"abbrevTitle":"CLDB","coverImgSrc":"journal/img/cover/CLDB.jpg","id":"8","issnPpub":"1005-023X","publisherId":"CLDB","title":"材料导报"},"keywords":[{"id":"d7e4a20c-20ae-48b2-ae90-23ea4c5eabee","keyword":"磁控溅射","originalKeyword":"磁控溅射"},{"id":"d32cc338-ea42-44b5-af3a-4dc09305e81b","keyword":"氧化钒薄膜","originalKeyword":"氧化钒薄膜"},{"id":"057f1edd-b001-4055-aa5e-8761d82fc1af","keyword":"溅射电压","originalKeyword":"溅射电压"},{"id":"c1d6e951-7839-460c-93fa-102d7e8c4541","keyword":"石英晶振频率","originalKeyword":"石英晶振频率"}],"language":"zh","publisherId":"cldb2007z2062","title":"<span style=\"color:red\">氩</span><span style=\"color:red\">流量</span>对氧化钒薄膜直流磁控溅射制备的影响","volume":"21","year":"2007"},{"abstractinfo":"针对钢包底吹<span style=\"color:red\">氩</span>工艺，通过改变透气砖数量、单透气砖吹气位置、双透气砖夹角、喷吹气体<span style=\"color:red\">流量</span>、渣厚等参数，对钢包的均混时间进行了水模型实验研究。提出临界<span style=\"color:red\">流量</span>的概念，发现吹气量超过临界<span style=\"color:red\">流量</span>后均混时间明显减小。结果表明：单透气砖喷吹时，相同吹气量下偏心喷吹时的均混时间<span style=\"color:red\">比</span>中心喷吹时短，临界<span style=\"color:red\">流量</span>小；双透气砖喷吹时，透气砖夹角越大，均混时间越短，临界<span style=\"color:red\">流量</span>越小。","authors":[{"authorName":"刘中秋","id":"0c6579f3-7695-47ce-b9df-3f50d7fef073","originalAuthorName":"刘中秋"},{"authorName":"李林敏","id":"f07c38e4-91bb-4b58-a949-5f4c1519c68f","originalAuthorName":"李林敏"},{"authorName":"曹茂雪","id":"c872da1f-54b4-4cee-a8f1-3aaf649e44df","originalAuthorName":"曹茂雪"},{"authorName":"李宝宽","id":"d7db6acb-59cf-4a82-bbd6-1c419b20e32b","originalAuthorName":"李宝宽"}],"doi":"10.14186/j.cnki.1671-6620.2016.03.004","fpage":"176","id":"25543089-d7ed-45a2-b64a-baea77306307","issue":"3","journal":{"abbrevTitle":"CLYYJXB","coverImgSrc":"journal/img/cover/CLYYJXB.jpg","id":"17","issnPpub":"1671-6620","publisherId":"CLYYJXB","title":"材料与冶金学报"},"keywords":[{"id":"ba87f1e0-c0e2-448d-9616-12c807550a55","keyword":"钢包","originalKeyword":"钢包"},{"id":"123f2f2b-2f0b-416d-bedd-00f89bcdce4d","keyword":"均混时间","originalKeyword":"均混时间"},{"id":"38816ed6-d8b5-4c38-ad2c-74967f2c2ca7","keyword":"临界<span style=\"color:red\">流量</span>","originalKeyword":"临界流量"},{"id":"ff98addf-922e-4408-b5c2-7aecb4d28ce5","keyword":"水模型实验","originalKeyword":"水模型实验"}],"language":"zh","publisherId":"clyyjxb201603004","title":"钢包底吹<span style=\"color:red\">氩</span>均混时间及临界<span style=\"color:red\">流量</span>水模型实验","volume":"15","year":"2016"},{"abstractinfo":"采用射频反应磁控溅射方法制备氧化钒(VOx)薄膜,对样品的沉积速率、物相结构、表面形貌和可见光波段的透过率进行表征,研究了在沉积气压一定的情况下,氧<span style=\"color:red\">氩</span><span style=\"color:red\">流量</span>比对氧化钒薄膜结构和光学性能的影响.结果表明,改变氧<span style=\"color:red\">氩</span><span style=\"color:red\">流量</span><span style=\"color:red\">比</span>可明显改变薄膜结构,随着氧气比例的增加,沉积速率下降,薄膜表面出现了颗粒结构,颗粒尺寸具有增大的趋势,光透过率增大.","authors":[{"authorName":"杜姗","id":"08aafd4a-ec16-455b-bfdf-1779b772ef6a","originalAuthorName":"杜姗"},{"authorName":"黄美东","id":"b5394dc0-2c27-4890-b7e0-5dc35cbeaa9a","originalAuthorName":"黄美东"},{"authorName":"刘春伟","id":"ed52c919-d9eb-4aae-8561-7e7125ed6f81","originalAuthorName":"刘春伟"},{"authorName":"唐晓红","id":"0c63c315-44f3-468a-b6af-bc60b2867627","originalAuthorName":"唐晓红"},{"authorName":"吕长东","id":"917ffb75-e453-47ba-910b-60c4ccbc4c7b","originalAuthorName":"吕长东"}],"doi":"","fpage":"24","id":"72d989f6-54cf-4fd9-b42a-710f4c26bf80","issue":"4","journal":{"abbrevTitle":"BMJS","coverImgSrc":"journal/img/cover/BMJS.jpg","id":"3","issnPpub":"1001-3660","publisherId":"BMJS","title":"表面技术   "},"keywords":[{"id":"dae089c2-3b4a-4b9f-ae3b-101361a9a684","keyword":"氧化钒薄膜","originalKeyword":"氧化钒薄膜"},{"id":"0c6a3175-e772-4ebb-8907-b78148bf2a29","keyword":"氧气<span style=\"color:red\">流量</span>","originalKeyword":"氧气流量"},{"id":"a4b98cec-ec7c-413e-b0e6-8694e4fcb959","keyword":"氩气<span style=\"color:red\">流量</span>","originalKeyword":"氩气流量"},{"id":"8e9be052-f38d-4686-9ad9-f98de1dcad79","keyword":"反应磁控溅射","originalKeyword":"反应磁控溅射"}],"language":"zh","publisherId":"bmjs201304007","title":"氧<span style=\"color:red\">氩</span><span style=\"color:red\">流量</span>比对溅射氧化钒薄膜结构和光学性能的影响","volume":"42","year":"2013"}],"totalpage":2432,"totalrecord":24314}